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The annealing behavior of hydrogen implanted into Al-Si alloy

Abstract

We have studied effects of not only defects but also an added elements on trap-sites of hydrogen in metals. For the purpose, we observed depth profiles and thermal behaviors of hydrogen implanted into Al-1.5at.%Si alloy samples in an implantation-temperature range of liquid nitrogen temperature (LNT) to 373K at different doses. The results were compared with those for pure aluminum samples. It was found that hydrogen is trapped as molecules in grain boundaries of Al/Si. (author)
Authors:
Ogura, Masahiko; Yamaji, Norisuke; Imai, Makoto; Itoh, Akio; Imanishi, Nobutsugu [1] 
  1. Kyoto Univ. (Japan). Faculty of Engineering
Publication Date:
Mar 01, 1997
Product Type:
Conference
Report Number:
JAERI-Conf-97-003; CONF-9603254-
Reference Number:
SCA: 360102; PA: JPN-97:010159; EDB-98:038710; SN: 98001890502
Resource Relation:
Journal Volume: 49; Journal Issue: 6; Conference: 7. international symposium on advanced nuclear energy research, Takasaki (Japan), 18-20 Mar 1996; Other Information: PBD: Mar 1997; Related Information: Is Part Of Recent progress in accelerator beam application. Proceedings of the 7th international symposium on advanced nuclear energy research; PB: 553 p.
Subject:
36 MATERIALS SCIENCE; INTERMETALLIC COMPOUNDS; ION IMPLANTATION; PROTON BEAMS; ALUMINIUM BASE ALLOYS; SILICON ALLOYS; ANNEALING; TRAPPING; DEPTH; SPATIAL DISTRIBUTION; HYDROGEN; DOSE-RESPONSE RELATIONSHIPS; THERMODYNAMIC PROPERTIES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0065-0273 K; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; ELEMENT ABUNDANCE; GRAIN BOUNDARIES
OSTI ID:
588419
Research Organizations:
Japan Atomic Energy Research Inst., Tokyo (Japan)
Country of Origin:
Japan
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0969-806X; Other: ON: DE97764433; TRN: JP9710159
Availability:
OSTI as DE97764433
Submitting Site:
JPN
Size:
pp. 391-395
Announcement Date:
May 08, 1998

Citation Formats

Ogura, Masahiko, Yamaji, Norisuke, Imai, Makoto, Itoh, Akio, and Imanishi, Nobutsugu. The annealing behavior of hydrogen implanted into Al-Si alloy. Japan: N. p., 1997. Web. doi:10.1016/S0969-806X(97)00014-5.
Ogura, Masahiko, Yamaji, Norisuke, Imai, Makoto, Itoh, Akio, & Imanishi, Nobutsugu. The annealing behavior of hydrogen implanted into Al-Si alloy. Japan. https://doi.org/10.1016/S0969-806X(97)00014-5
Ogura, Masahiko, Yamaji, Norisuke, Imai, Makoto, Itoh, Akio, and Imanishi, Nobutsugu. 1997. "The annealing behavior of hydrogen implanted into Al-Si alloy." Japan. https://doi.org/10.1016/S0969-806X(97)00014-5.
@misc{etde_588419,
title = {The annealing behavior of hydrogen implanted into Al-Si alloy}
author = {Ogura, Masahiko, Yamaji, Norisuke, Imai, Makoto, Itoh, Akio, and Imanishi, Nobutsugu}
abstractNote = {We have studied effects of not only defects but also an added elements on trap-sites of hydrogen in metals. For the purpose, we observed depth profiles and thermal behaviors of hydrogen implanted into Al-1.5at.%Si alloy samples in an implantation-temperature range of liquid nitrogen temperature (LNT) to 373K at different doses. The results were compared with those for pure aluminum samples. It was found that hydrogen is trapped as molecules in grain boundaries of Al/Si. (author)}
doi = {10.1016/S0969-806X(97)00014-5}
issue = {6}
volume = {49}
place = {Japan}
year = {1997}
month = {Mar}
}