You need JavaScript to view this

New directions for ion beam processing of optical materials

Abstract

Recent developments in the use of ion implantation to modify the properties of optical materials are summarized. The use of ion implantation to form nanocrystal and quantum dots is emphasized. (author)
Authors:
White, C W; Budai, J D; Zhu, J G; Withrow, S P [1] 
  1. Oak Ridge National Lab., TN (United States)
Publication Date:
Mar 01, 1997
Product Type:
Conference
Report Number:
JAERI-Conf-97-003; CONF-9603254-
Reference Number:
SCA: 360206; PA: JPN-97:010085; EDB-98:039174; SN: 98001890428
Resource Relation:
Conference: 7. international symposium on advanced nuclear energy research, Takasaki (Japan), 18-20 Mar 1996; Other Information: PBD: Mar 1997; Related Information: Is Part Of Recent progress in accelerator beam application. Proceedings of the 7th international symposium on advanced nuclear energy research; PB: 553 p.
Subject:
36 MATERIALS SCIENCE; LITHIUM COMPOUNDS; NIOBATES; ERBIUM; ALUMINIUM OXIDES; GALLIUM ARSENIDES; SILICON; SILICON OXIDES; ION IMPLANTATION; CRYSTAL DOPING; DOPED MATERIALS; ION BEAMS; OPTICAL PROPERTIES; WAVEGUIDES
OSTI ID:
588281
Research Organizations:
Japan Atomic Energy Research Inst., Tokyo (Japan)
Country of Origin:
Japan
Language:
English
Other Identifying Numbers:
Other: ON: DE97764433; TRN: JP9710085
Availability:
OSTI as DE97764433
Submitting Site:
JPN
Size:
pp. 33-38
Announcement Date:

Citation Formats

White, C W, Budai, J D, Zhu, J G, and Withrow, S P. New directions for ion beam processing of optical materials. Japan: N. p., 1997. Web.
White, C W, Budai, J D, Zhu, J G, & Withrow, S P. New directions for ion beam processing of optical materials. Japan.
White, C W, Budai, J D, Zhu, J G, and Withrow, S P. 1997. "New directions for ion beam processing of optical materials." Japan.
@misc{etde_588281,
title = {New directions for ion beam processing of optical materials}
author = {White, C W, Budai, J D, Zhu, J G, and Withrow, S P}
abstractNote = {Recent developments in the use of ion implantation to modify the properties of optical materials are summarized. The use of ion implantation to form nanocrystal and quantum dots is emphasized. (author)}
place = {Japan}
year = {1997}
month = {Mar}
}