Abstract
Nitrides of titanium, chromium, molybdenum and tantalum were prepared by evaporation of the metal in an atmosphere of reduced nitrogen pressure under simultaneous irradiation with highly energetic nitrogen ions. - Chemical analysis showed that the elemental composition of the nitrides is strongly correlated with ion irradiation intensity and with chemical reactivity of the metal. Under identical process conditions titanium formed TiN, but chromium Cr{sub 2}N. In case of molybdenum and tantalum X-ray diffractometry revealed that by deposition under ion irradiation with high energy and beam intensity metastable nitrides with cubic structure could be formed. (orig.).
Ensinger, W
[1]
- Univ. Heidelberg, Inst. fuer Physikalische Chemie (Germany)
Citation Formats
Ensinger, W.
Film synthesis of transition metal nitrides by ionbeam-assisted vapour deposition. Schichtsynthese von Uebergangsmetallnitriden mit ionenstrahlunterstuetztem Aufdampfen.
Germany: N. p.,
1991.
Web.
Ensinger, W.
Film synthesis of transition metal nitrides by ionbeam-assisted vapour deposition. Schichtsynthese von Uebergangsmetallnitriden mit ionenstrahlunterstuetztem Aufdampfen.
Germany.
Ensinger, W.
1991.
"Film synthesis of transition metal nitrides by ionbeam-assisted vapour deposition. Schichtsynthese von Uebergangsmetallnitriden mit ionenstrahlunterstuetztem Aufdampfen."
Germany.
@misc{etde_5761098,
title = {Film synthesis of transition metal nitrides by ionbeam-assisted vapour deposition. Schichtsynthese von Uebergangsmetallnitriden mit ionenstrahlunterstuetztem Aufdampfen}
author = {Ensinger, W}
abstractNote = {Nitrides of titanium, chromium, molybdenum and tantalum were prepared by evaporation of the metal in an atmosphere of reduced nitrogen pressure under simultaneous irradiation with highly energetic nitrogen ions. - Chemical analysis showed that the elemental composition of the nitrides is strongly correlated with ion irradiation intensity and with chemical reactivity of the metal. Under identical process conditions titanium formed TiN, but chromium Cr{sub 2}N. In case of molybdenum and tantalum X-ray diffractometry revealed that by deposition under ion irradiation with high energy and beam intensity metastable nitrides with cubic structure could be formed. (orig.).}
journal = []
volume = {95:11}
place = {Germany}
year = {1991}
month = {Nov}
}
title = {Film synthesis of transition metal nitrides by ionbeam-assisted vapour deposition. Schichtsynthese von Uebergangsmetallnitriden mit ionenstrahlunterstuetztem Aufdampfen}
author = {Ensinger, W}
abstractNote = {Nitrides of titanium, chromium, molybdenum and tantalum were prepared by evaporation of the metal in an atmosphere of reduced nitrogen pressure under simultaneous irradiation with highly energetic nitrogen ions. - Chemical analysis showed that the elemental composition of the nitrides is strongly correlated with ion irradiation intensity and with chemical reactivity of the metal. Under identical process conditions titanium formed TiN, but chromium Cr{sub 2}N. In case of molybdenum and tantalum X-ray diffractometry revealed that by deposition under ion irradiation with high energy and beam intensity metastable nitrides with cubic structure could be formed. (orig.).}
journal = []
volume = {95:11}
place = {Germany}
year = {1991}
month = {Nov}
}