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X-ray diffraction studies of silicon implanted with high energy ions

Abstract

The character of lattice deformation in silicon in implanted with high energy {alpha} particles and protons was studied with a number of X-ray methods. The experiments included double crystal spectrometer method as well as single crystal section and projection topography realised both with conventional and synchrotron X-ray sources. All observed diffraction patterns were reasonably explainable assuming the lattice parameter depth distribution proportional to the vacancy-interstitial distribution coming from the Biersack-Ziegler theory. The theoretical rocking curves and density distribution in back-reflection double-crystal and section topography well corresponding to experimental results were calculated using numerical integration of the Takagi-Taupin equations. 9 figs.
Authors:
Wieteska, K; [1]  Wierzchowski, W; [2]  Graeff, W [3] 
  1. Institute of Atomic Energy, Otwock-Swierk, (Poland)
  2. Institute of Electronic Materials Technology, Warsaw, (Poland)
  3. Hasylab at Desy, Hamburg, (Germany)
Publication Date:
Dec 31, 1996
Product Type:
Miscellaneous
Report Number:
INIS-EG-005; CONF-9611191-
Reference Number:
SCA: 665300; PA: AIX-28:060642; EDB-97:123187; SN: 97001845130
Resource Relation:
Conference: 3. radiation physics conference, Cairo (Egypt), 13-17 Nov 1996; Other Information: PBD: 1996; Related Information: Is Part Of Proceedings of the third Radiation Physics Conference. Vol. 1; Gomaa, M.A.; El-Behay, A.Z.; Hassib, G.M.; El-Naggar, A.M. [eds.]; PB: 332 p.
Subject:
66 PHYSICS; SILICON; X-RAY DIFFRACTION; ALPHA PARTICLES; CRYSTAL LATTICES; DISTRIBUTION; HIGH ENERGY PHYSICS; IONS; PROTONS; THEORETICAL DATA
OSTI ID:
521486
Research Organizations:
Atomic Energy Establishment, Cairo (Egypt)
Country of Origin:
Egypt
Language:
English
Other Identifying Numbers:
Other: ON: DE97639506; TRN: EG9700078060642
Availability:
INIS; OSTI as DE97639506
Submitting Site:
INIS
Size:
pp. 136-143
Announcement Date:
Sep 24, 1997

Citation Formats

Wieteska, K, Wierzchowski, W, and Graeff, W. X-ray diffraction studies of silicon implanted with high energy ions. Egypt: N. p., 1996. Web.
Wieteska, K, Wierzchowski, W, & Graeff, W. X-ray diffraction studies of silicon implanted with high energy ions. Egypt.
Wieteska, K, Wierzchowski, W, and Graeff, W. 1996. "X-ray diffraction studies of silicon implanted with high energy ions." Egypt.
@misc{etde_521486,
title = {X-ray diffraction studies of silicon implanted with high energy ions}
author = {Wieteska, K, Wierzchowski, W, and Graeff, W}
abstractNote = {The character of lattice deformation in silicon in implanted with high energy {alpha} particles and protons was studied with a number of X-ray methods. The experiments included double crystal spectrometer method as well as single crystal section and projection topography realised both with conventional and synchrotron X-ray sources. All observed diffraction patterns were reasonably explainable assuming the lattice parameter depth distribution proportional to the vacancy-interstitial distribution coming from the Biersack-Ziegler theory. The theoretical rocking curves and density distribution in back-reflection double-crystal and section topography well corresponding to experimental results were calculated using numerical integration of the Takagi-Taupin equations. 9 figs.}
place = {Egypt}
year = {1996}
month = {Dec}
}