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Co-sputtered optical films

Conference:

Abstract

The co-sputtering of two dielectric materials with indices of refraction as widely different as possible has been investigated with the aim of obtaining both homogeneous films with an intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module is described which has been especially designed, with two separate cathodes and two independent tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO/sub 2/, TiO2 and SiO/sub 2/ targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness are reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest are discussed.
Authors:
Misiano, C; Simonetti, E [1] 
  1. Selenia S.p.A., Rome (Italy)
Publication Date:
Jun 01, 1977
Product Type:
Conference
Reference Number:
AIX-09-348826; EDB-78-044947
Resource Relation:
Journal Name: Vacuum; (United Kingdom); Journal Volume: 27:4; Conference: International symposium on vacuum and thin film technology, Uppsala, Sweden, 31 Aug - 3 Sep 1976
Subject:
36 MATERIALS SCIENCE; CERIUM OXIDES; REFRACTORY METALS; SPUTTERING; SILICON OXIDES; TITANIUM OXIDES; DIELECTRIC MATERIALS; FILMS; OPACITY; PERFORMANCE; RF SYSTEMS; SURFACE COATING; THICKNESS; CERIUM COMPOUNDS; CHALCOGENIDES; DEPOSITION; DIMENSIONS; ELEMENTS; METALS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RARE EARTH COMPOUNDS; SILICON COMPOUNDS; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360204 - Ceramics, Cermets, & Refractories- Physical Properties; 360601 - Other Materials- Preparation & Manufacture; 360603 - Materials- Properties
OSTI ID:
5186460
Country of Origin:
United Kingdom
Language:
English
Other Identifying Numbers:
Journal ID: CODEN: VACUA
Submitting Site:
INIS
Size:
Pages: 403-406
Announcement Date:
May 13, 2001

Conference:

Citation Formats

Misiano, C, and Simonetti, E. Co-sputtered optical films. United Kingdom: N. p., 1977. Web.
Misiano, C, & Simonetti, E. Co-sputtered optical films. United Kingdom.
Misiano, C, and Simonetti, E. 1977. "Co-sputtered optical films." United Kingdom.
@misc{etde_5186460,
title = {Co-sputtered optical films}
author = {Misiano, C, and Simonetti, E}
abstractNote = {The co-sputtering of two dielectric materials with indices of refraction as widely different as possible has been investigated with the aim of obtaining both homogeneous films with an intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module is described which has been especially designed, with two separate cathodes and two independent tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO/sub 2/, TiO2 and SiO/sub 2/ targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness are reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest are discussed.}
journal = {Vacuum; (United Kingdom)}
volume = {27:4}
place = {United Kingdom}
year = {1977}
month = {Jun}
}