Abstract
A new design of a broad beam RF ion source is made to be capable to deliver wide and uniform beam with currents reaching (100 {mu} A up to 30 mA) at extraction voltages (200 V up to 2 kV). Its plasma intensifying system is made with the addition of electrons from an immersed filament in the discharge and axial magnetic field (70 up to 300 G). A uniform beam distribution is made with a planner graphite cathode which has a number of holes arranged to produce perveance matching with the normal Gaussian distribution of the beam density. These holes are arranged in a consequent orbits with equal distance between the adjacent holes in each orbit. These holes increase in diameter with increasing the orbit radius. This allows increasing the extracted ion currents at the source outer edges and decreases its value at the source inner region; producing wide and uniform beam which is suitable for material modifications. The beam profiles are traced with electromechanical scanner and X-Y recorder. The perveance matching is found to produce a beam uniformity of =66% of its width which reaches =6 cm. The variation of the output currents are with the variation of extraction
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Abdelaziz, M E;
Zakhary, S G;
Ghanem, A A;
Abdel-Ghaffar, A M
[1]
- Ion Sources and Accelerators Department, Nuclear Research Center, Atomic Energy Authority, Cairo, (Egypt)
Citation Formats
Abdelaziz, M E, Zakhary, S G, Ghanem, A A, and Abdel-Ghaffar, A M.
Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2.
Egypt: N. p.,
1996.
Web.
Abdelaziz, M E, Zakhary, S G, Ghanem, A A, & Abdel-Ghaffar, A M.
Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2.
Egypt.
Abdelaziz, M E, Zakhary, S G, Ghanem, A A, and Abdel-Ghaffar, A M.
1996.
"Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2."
Egypt.
@misc{etde_456052,
title = {Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2}
author = {Abdelaziz, M E, Zakhary, S G, Ghanem, A A, and Abdel-Ghaffar, A M}
abstractNote = {A new design of a broad beam RF ion source is made to be capable to deliver wide and uniform beam with currents reaching (100 {mu} A up to 30 mA) at extraction voltages (200 V up to 2 kV). Its plasma intensifying system is made with the addition of electrons from an immersed filament in the discharge and axial magnetic field (70 up to 300 G). A uniform beam distribution is made with a planner graphite cathode which has a number of holes arranged to produce perveance matching with the normal Gaussian distribution of the beam density. These holes are arranged in a consequent orbits with equal distance between the adjacent holes in each orbit. These holes increase in diameter with increasing the orbit radius. This allows increasing the extracted ion currents at the source outer edges and decreases its value at the source inner region; producing wide and uniform beam which is suitable for material modifications. The beam profiles are traced with electromechanical scanner and X-Y recorder. The perveance matching is found to produce a beam uniformity of =66% of its width which reaches =6 cm. The variation of the output currents are with the variation of extraction voltages, magnetic field, discharge pressure and electron injection into the plasma. The extracted current increases with the increase of the discharge pressure, RF power and magnetic field intensity. The influence of electron plasma interaction is found to have a great effect on increasing the ion currents to about four times its value without electron interaction, however, this increase is limited due to presence of breakdown at V{sub ex} > 2 kV. The simple design of this source, its cleanness due to the use of pyrex discharge bottle, easy operation and maintenance adds other features to this broad beam type ion source which makes it suitable for metallurgical applications in broad beam accelerators. 6 figs.}
place = {Egypt}
year = {1996}
month = {Mar}
}
title = {Preliminary results of a broad beam RF ion source with electron plasma interaction. Vol. 2}
author = {Abdelaziz, M E, Zakhary, S G, Ghanem, A A, and Abdel-Ghaffar, A M}
abstractNote = {A new design of a broad beam RF ion source is made to be capable to deliver wide and uniform beam with currents reaching (100 {mu} A up to 30 mA) at extraction voltages (200 V up to 2 kV). Its plasma intensifying system is made with the addition of electrons from an immersed filament in the discharge and axial magnetic field (70 up to 300 G). A uniform beam distribution is made with a planner graphite cathode which has a number of holes arranged to produce perveance matching with the normal Gaussian distribution of the beam density. These holes are arranged in a consequent orbits with equal distance between the adjacent holes in each orbit. These holes increase in diameter with increasing the orbit radius. This allows increasing the extracted ion currents at the source outer edges and decreases its value at the source inner region; producing wide and uniform beam which is suitable for material modifications. The beam profiles are traced with electromechanical scanner and X-Y recorder. The perveance matching is found to produce a beam uniformity of =66% of its width which reaches =6 cm. The variation of the output currents are with the variation of extraction voltages, magnetic field, discharge pressure and electron injection into the plasma. The extracted current increases with the increase of the discharge pressure, RF power and magnetic field intensity. The influence of electron plasma interaction is found to have a great effect on increasing the ion currents to about four times its value without electron interaction, however, this increase is limited due to presence of breakdown at V{sub ex} > 2 kV. The simple design of this source, its cleanness due to the use of pyrex discharge bottle, easy operation and maintenance adds other features to this broad beam type ion source which makes it suitable for metallurgical applications in broad beam accelerators. 6 figs.}
place = {Egypt}
year = {1996}
month = {Mar}
}