Abstract
The present review provides a very brief introduction of the historical development of this recent trend type of ion sources. There are two main types of this source which use the microwave power (2.45 up to 20 GHz). ECR ion sources that can generate substantial currents of very high charge state ions ( for example ions of U with charge state +39, with intensities of a few hundred nano amperes for injection directly into cyclotrons or synchrotrons), and the microwave sources that can generate currents (100-500 mA) for ion implanters and accelerator injectors. In this work, the theory of the microwave discharge and influence of resonance on increasing the power density consumed by the discharge are studied. The power density consumed by the discharge is found to increase with increase of number of electrons in the discharge, and decreases with increase of discharge pressure. The description of the main components and factors affecting the design of the source are declared. Also the factors enhancing source performance such as: plasma cooling by the addition of light ions which absorb energy from the heavy ions thereby increasing the lifetime of the heavy ions, and increasing the extent of highly charged ions. Injection
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Zakhary, S G
[1]
- Ion Sources and Accelerators Department, Nuclear Research Center, Atomic Energy Authority, Cairo, (Egypt)
Citation Formats
Zakhary, S G.
Development status of electron cyclotron resonance ion sources (ECRIS). Vol. 2.
Egypt: N. p.,
1996.
Web.
Zakhary, S G.
Development status of electron cyclotron resonance ion sources (ECRIS). Vol. 2.
Egypt.
Zakhary, S G.
1996.
"Development status of electron cyclotron resonance ion sources (ECRIS). Vol. 2."
Egypt.
@misc{etde_456051,
title = {Development status of electron cyclotron resonance ion sources (ECRIS). Vol. 2}
author = {Zakhary, S G}
abstractNote = {The present review provides a very brief introduction of the historical development of this recent trend type of ion sources. There are two main types of this source which use the microwave power (2.45 up to 20 GHz). ECR ion sources that can generate substantial currents of very high charge state ions ( for example ions of U with charge state +39, with intensities of a few hundred nano amperes for injection directly into cyclotrons or synchrotrons), and the microwave sources that can generate currents (100-500 mA) for ion implanters and accelerator injectors. In this work, the theory of the microwave discharge and influence of resonance on increasing the power density consumed by the discharge are studied. The power density consumed by the discharge is found to increase with increase of number of electrons in the discharge, and decreases with increase of discharge pressure. The description of the main components and factors affecting the design of the source are declared. Also the factors enhancing source performance such as: plasma cooling by the addition of light ions which absorb energy from the heavy ions thereby increasing the lifetime of the heavy ions, and increasing the extent of highly charged ions. Injection of electrons into the discharge increases the extracted ion current, and the decrease of the magnetic field in the extraction region decreases the beam emittance. 12 figs.}
place = {Egypt}
year = {1996}
month = {Mar}
}
title = {Development status of electron cyclotron resonance ion sources (ECRIS). Vol. 2}
author = {Zakhary, S G}
abstractNote = {The present review provides a very brief introduction of the historical development of this recent trend type of ion sources. There are two main types of this source which use the microwave power (2.45 up to 20 GHz). ECR ion sources that can generate substantial currents of very high charge state ions ( for example ions of U with charge state +39, with intensities of a few hundred nano amperes for injection directly into cyclotrons or synchrotrons), and the microwave sources that can generate currents (100-500 mA) for ion implanters and accelerator injectors. In this work, the theory of the microwave discharge and influence of resonance on increasing the power density consumed by the discharge are studied. The power density consumed by the discharge is found to increase with increase of number of electrons in the discharge, and decreases with increase of discharge pressure. The description of the main components and factors affecting the design of the source are declared. Also the factors enhancing source performance such as: plasma cooling by the addition of light ions which absorb energy from the heavy ions thereby increasing the lifetime of the heavy ions, and increasing the extent of highly charged ions. Injection of electrons into the discharge increases the extracted ion current, and the decrease of the magnetic field in the extraction region decreases the beam emittance. 12 figs.}
place = {Egypt}
year = {1996}
month = {Mar}
}