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Raman microprobe measurements of stress in ion implanted materials

Abstract

Raman microprobe measurements of ion implanted diamond and silicon have shown significant shifts in the Raman line due to stresses in the materials. The Raman line shifts to higher energy if the stress is compressive and to lower energy for tensile stress{sup 1}. The silicon sample was implanted in a 60 {mu}m square with 2.56 x 10{sup 17} ions per square centimeter of 2 MeV Helium. This led to the formation of raised squares with the top 370mm above the original surface. In Raman studies of silicon using visible light, the depth of penetration of the laser beam into the sample is much less than one micron. It was found that the Raman line is due to the silicon overlying the damage region. The diamond sample was implanted with 2 x 10{sup 15} ions per square centimeter of 2.8 MeV carbon. It was concluded that the Raman spectrum could provide information concerning both the magnitude and the direction of stress in an ion implanted sample. It was possible in some cases to determine whether the stress direction is parallel or perpendicular to the sample surface. 1 refs., 2 figs.
Authors:
Nugent, K W; Prawer, S; Weiser, P S; Dooley, S P [1] 
  1. Melbourne Univ., Parkville, VIC (Australia). School of Physics
Publication Date:
Dec 31, 1993
Product Type:
Miscellaneous
Report Number:
INIS-mf-15527; CONF-9311143-
Reference Number:
SCA: 665300; 360605; PA: AIX-28:027255; EDB-97:046785; SN: 97001753931
Resource Relation:
Conference: 8. Australian conference on nuclear techniques of analysis, Sydney (Australia), 17-19 Nov 1993; Other Information: PBD: 1993; Related Information: Is Part Of Proceedings of the 8. Australian conference on nuclear techniques of analysis; PB: 194 p.
Subject:
66 PHYSICS; 36 MATERIALS SCIENCE; DIAMONDS; CARBON IONS; ION IMPLANTATION; PHYSICAL RADIATION EFFECTS; SILICON; HELIUM IONS; EXPERIMENTAL DATA; RAMAN SPECTRA; SPECTRAL SHIFT; STRESSES; TENSILE PROPERTIES
OSTI ID:
446221
Country of Origin:
Australia
Language:
English
Other Identifying Numbers:
Other: ON: DE97616714; TRN: AU9715794027255
Availability:
INIS; OSTI as DE97616714
Submitting Site:
AUN
Size:
pp. 137-139
Announcement Date:
Mar 28, 1997

Citation Formats

Nugent, K W, Prawer, S, Weiser, P S, and Dooley, S P. Raman microprobe measurements of stress in ion implanted materials. Australia: N. p., 1993. Web.
Nugent, K W, Prawer, S, Weiser, P S, & Dooley, S P. Raman microprobe measurements of stress in ion implanted materials. Australia.
Nugent, K W, Prawer, S, Weiser, P S, and Dooley, S P. 1993. "Raman microprobe measurements of stress in ion implanted materials." Australia.
@misc{etde_446221,
title = {Raman microprobe measurements of stress in ion implanted materials}
author = {Nugent, K W, Prawer, S, Weiser, P S, and Dooley, S P}
abstractNote = {Raman microprobe measurements of ion implanted diamond and silicon have shown significant shifts in the Raman line due to stresses in the materials. The Raman line shifts to higher energy if the stress is compressive and to lower energy for tensile stress{sup 1}. The silicon sample was implanted in a 60 {mu}m square with 2.56 x 10{sup 17} ions per square centimeter of 2 MeV Helium. This led to the formation of raised squares with the top 370mm above the original surface. In Raman studies of silicon using visible light, the depth of penetration of the laser beam into the sample is much less than one micron. It was found that the Raman line is due to the silicon overlying the damage region. The diamond sample was implanted with 2 x 10{sup 15} ions per square centimeter of 2.8 MeV carbon. It was concluded that the Raman spectrum could provide information concerning both the magnitude and the direction of stress in an ion implanted sample. It was possible in some cases to determine whether the stress direction is parallel or perpendicular to the sample surface. 1 refs., 2 figs.}
place = {Australia}
year = {1993}
month = {Dec}
}