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Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (low-cost Si sheets by continuous casting method); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (renzoku cast ho ni yoru tei cost Si kiban seizo gijutsu kaihatsu)

Abstract

This paper reports the study results on manufacturing of low-cost Si substrates by continuous casting method in fiscal 1994. (1) On manufacturing of ingots of 16 piece size, the ingot of nearly 170kg was manufactured by batch process using the Si melt injection unit prepared in last year. (2) On oxygen and carbon contents in wafers, the contents were measured by FT-IR after slicing of the ingot. As a result, the oxygen and carbon contents could be successfully reduced to the targets of 10ppma and 5ppma or less, respectively. (3) The resistivity distribution of the ingot ranged over the target of 1-2ohm-cm. (4) Cells of 100 {times} 100mm{sup 2} wide and 350{mu}m thick were verified by in-house evaluation process. Although lower cell conversion efficiency was found at the center top of the ingot, a vertical efficiency stability was nearly sufficient as a whole. (5) On the crystal growth unit prepared in fiscal 1994, any problems were not found on automatic driving and vibration during moving. 8 figs.
Authors:
Tatsuta, M [1] 
  1. New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Publication Date:
Dec 01, 1994
Product Type:
Technical Report
Report Number:
ETDE/JP-mf-97725454
Reference Number:
SCA: 140501; PA: NEDO-96:820196; EDB-97:024891; SN: 97001728477
Resource Relation:
Other Information: PBD: Dec 1994; Related Information: Is Part Of Japan`s New Sunshine Project. 1994 annual summary of solar energy R and D program; PB: 522 p.; 1994 nendo new sunshine keikaku. Seika hokokusho gaiyoshu (taiyo energy)
Subject:
14 SOLAR ENERGY; PHOTOVOLTAIC CELLS; POLYCRYSTALS; SILICON; MANUFACTURING; COST; CASTING; CONCENTRATION RATIO; OXYGEN; CARBON; THIN FILMS; ELECTRIC CONDUCTIVITY
OSTI ID:
425150
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE97725454; TRN: 96:820196
Availability:
Available from Office of Scientific and Technical Information, P.O.Box 1000, Oak Ridge Tennessee 37831, USA; OSTI as DE97725454
Submitting Site:
NEDO
Size:
pp. 12-17
Announcement Date:
Feb 14, 1997

Citation Formats

Tatsuta, M. Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (low-cost Si sheets by continuous casting method); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (renzoku cast ho ni yoru tei cost Si kiban seizo gijutsu kaihatsu). Japan: N. p., 1994. Web.
Tatsuta, M. Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (low-cost Si sheets by continuous casting method); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (renzoku cast ho ni yoru tei cost Si kiban seizo gijutsu kaihatsu). Japan.
Tatsuta, M. 1994. "Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (low-cost Si sheets by continuous casting method); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (renzoku cast ho ni yoru tei cost Si kiban seizo gijutsu kaihatsu)." Japan.
@misc{etde_425150,
title = {Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (low-cost Si sheets by continuous casting method); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (renzoku cast ho ni yoru tei cost Si kiban seizo gijutsu kaihatsu)}
author = {Tatsuta, M}
abstractNote = {This paper reports the study results on manufacturing of low-cost Si substrates by continuous casting method in fiscal 1994. (1) On manufacturing of ingots of 16 piece size, the ingot of nearly 170kg was manufactured by batch process using the Si melt injection unit prepared in last year. (2) On oxygen and carbon contents in wafers, the contents were measured by FT-IR after slicing of the ingot. As a result, the oxygen and carbon contents could be successfully reduced to the targets of 10ppma and 5ppma or less, respectively. (3) The resistivity distribution of the ingot ranged over the target of 1-2ohm-cm. (4) Cells of 100 {times} 100mm{sup 2} wide and 350{mu}m thick were verified by in-house evaluation process. Although lower cell conversion efficiency was found at the center top of the ingot, a vertical efficiency stability was nearly sufficient as a whole. (5) On the crystal growth unit prepared in fiscal 1994, any problems were not found on automatic driving and vibration during moving. 8 figs.}
place = {Japan}
year = {1994}
month = {Dec}
}