You need JavaScript to view this

Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (technical development for production of high purity silicon); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (taiyo denchiyo silicon seizo gijutsu kaihatsu)

Abstract

This paper reports the study results on development of manufacturing technologies of Si for solar cells in fiscal 1994. (1) P in Si could be successfully reduced to 0.1ppmw by EB melting method. The condition possible to reduce P in Si while continuously supplying metal Si was found. The 20kg class EB melting equipment was also designed and manufactured which can be connected with solidifying rough refining process. (2) Use of a water-cooling copper mold was studied using a small melting equipment for cost reduction in solidifying rough refining process. As a result, the prospect of crucible-free technology for removal of P and solidifying rough refining was obtained. (3) B in Si could be successfully reduced to the target of 0.1ppmw by vapor addition method using a plasma melting equipment. (4) The prototype SOG-Si achieved a conversion efficiency of 14.1% as solar cell. In addition, the advanced solar cell prepared by efficiency enhancement process achieved a conversion efficiency of 15.9%. 3 figs.
Authors:
Tatsuta, M [1] 
  1. New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Publication Date:
Dec 01, 1994
Product Type:
Technical Report
Report Number:
ETDE/JP-mf-97725454
Reference Number:
SCA: 140501; PA: NEDO-96:820194; EDB-97:024869; SN: 97001728475
Resource Relation:
Other Information: PBD: Dec 1994; Related Information: Is Part Of Japan`s New Sunshine Project. 1994 annual summary of solar energy R and D program; PB: 522 p.; 1994 nendo new sunshine keikaku. Seika hokokusho gaiyoshu (taiyo energy)
Subject:
14 SOLAR ENERGY; PHOTOVOLTAIC CELLS; MANUFACTURING; SILICON; THIN FILMS; POLYCRYSTALS; IMPURITIES; PHOSPHORUS; BORON; REFINING; PHOTOVOLTAIC CONVERSION
OSTI ID:
425148
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE97725454; TRN: 96:820194
Availability:
Available from Office of Scientific and Technical Information, P.O.Box 1000, Oak Ridge Tennessee 37831, USA; OSTI as DE97725454
Submitting Site:
NEDO
Size:
pp. 1-5
Announcement Date:
Feb 14, 1997

Citation Formats

Tatsuta, M. Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (technical development for production of high purity silicon); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (taiyo denchiyo silicon seizo gijutsu kaihatsu). Japan: N. p., 1994. Web.
Tatsuta, M. Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (technical development for production of high purity silicon); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (taiyo denchiyo silicon seizo gijutsu kaihatsu). Japan.
Tatsuta, M. 1994. "Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (technical development for production of high purity silicon); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (taiyo denchiyo silicon seizo gijutsu kaihatsu)." Japan.
@misc{etde_425148,
title = {Development of technology for thin substrate polycrystalline solar cells for practical use. Development of manufacturing technologies for low-cost substrates (technical development for production of high purity silicon); Usugata takessho taiyo denchi seizo gijutsu no jitsuyoka kenkyu. Tei cost kiban seizo gijutsu kaihatsu (taiyo denchiyo silicon seizo gijutsu kaihatsu)}
author = {Tatsuta, M}
abstractNote = {This paper reports the study results on development of manufacturing technologies of Si for solar cells in fiscal 1994. (1) P in Si could be successfully reduced to 0.1ppmw by EB melting method. The condition possible to reduce P in Si while continuously supplying metal Si was found. The 20kg class EB melting equipment was also designed and manufactured which can be connected with solidifying rough refining process. (2) Use of a water-cooling copper mold was studied using a small melting equipment for cost reduction in solidifying rough refining process. As a result, the prospect of crucible-free technology for removal of P and solidifying rough refining was obtained. (3) B in Si could be successfully reduced to the target of 0.1ppmw by vapor addition method using a plasma melting equipment. (4) The prototype SOG-Si achieved a conversion efficiency of 14.1% as solar cell. In addition, the advanced solar cell prepared by efficiency enhancement process achieved a conversion efficiency of 15.9%. 3 figs.}
place = {Japan}
year = {1994}
month = {Dec}
}