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Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu

Abstract

Research results of hard photon technology have been summarized as a part of novel technology development highly utilizing the quantum nature of photon. Hard photon technology refers to photon beam technologies which use photon in the 0.1 to 200 nm wavelength region. Hard photon has not been used in industry due to the lack of suitable photon sources and optical devices. However, hard photon in this wavelength region is expected to bring about innovations in such areas as ultrafine processing and material synthesis due to its atom selective reaction, inner shell excitation reaction, and spatially high resolution. Then, technological themes and possibility have been surveyed. Although there are principle proposes and their verification of individual technologies for the technologies of hard photon generation, regulation and utilization, they are still far from the practical applications. For the photon source technology, the laser diode pumped driver laser technology, laser plasma photon source technology, synchrotron radiation photon source technology, and vacuum ultraviolet photon source technology are presented. For the optical device technology, the multi-layer film technology for beam mirrors and the non-spherical lens processing technology are introduced. Also are described the reduction lithography technology, hard photon excitation process, and methods of analysis and  More>>
Authors:
"NONE"
Publication Date:
Mar 01, 1996
Product Type:
Technical Report
Report Number:
NEDO-PR-95012(2)
Reference Number:
SCA: 360000; 320302; 661220; 661300; 290500; PA: NEDO-96:820118; EDB-97:002991; NTS-97:005102; SN: 96001702457
Resource Relation:
Other Information: PBD: Mar 1996
Subject:
36 MATERIALS SCIENCE; 32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; 66 PHYSICS; 29 ENERGY PLANNING AND POLICY; PHOTONS; TECHNOLOGY IMPACTS; QUANTUM MECHANICS; PHOTON BEAMS; WAVELENGTHS; RADIATION SOURCES; OPTICAL SYSTEMS; MICROSTRUCTURE; MACHINING; CHEMICAL ACTIVATION; ELECTRONIC STRUCTURE; SPATIAL RESOLUTION; SYNTHESIS; LASER RADIATION; EXCITATION; SEMICONDUCTOR DIODES; PLASMA; SYNCHROTRON RADIATION; EXTREME ULTRAVIOLET RADIATION; ETCHING
OSTI ID:
402301
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE97717514; TRN: 96:820118
Availability:
Available from Office of Scientific and Technical Information, P.O.Box 1000, Oak Ridge Tennessee 37831, USA; OSTI as DE97717514
Submitting Site:
NEDO
Size:
279 p.
Announcement Date:

Citation Formats

Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu. Japan: N. p., 1996. Web.
Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu. Japan.
1996. "Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu." Japan.
@misc{etde_402301,
title = {Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu}
abstractNote = {Research results of hard photon technology have been summarized as a part of novel technology development highly utilizing the quantum nature of photon. Hard photon technology refers to photon beam technologies which use photon in the 0.1 to 200 nm wavelength region. Hard photon has not been used in industry due to the lack of suitable photon sources and optical devices. However, hard photon in this wavelength region is expected to bring about innovations in such areas as ultrafine processing and material synthesis due to its atom selective reaction, inner shell excitation reaction, and spatially high resolution. Then, technological themes and possibility have been surveyed. Although there are principle proposes and their verification of individual technologies for the technologies of hard photon generation, regulation and utilization, they are still far from the practical applications. For the photon source technology, the laser diode pumped driver laser technology, laser plasma photon source technology, synchrotron radiation photon source technology, and vacuum ultraviolet photon source technology are presented. For the optical device technology, the multi-layer film technology for beam mirrors and the non-spherical lens processing technology are introduced. Also are described the reduction lithography technology, hard photon excitation process, and methods of analysis and measurement. 430 refs., 165 figs., 23 tabs.}
place = {Japan}
year = {1996}
month = {Mar}
}