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Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`

Abstract

For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.
Authors:
"NONE"
Publication Date:
May 01, 1998
Product Type:
Technical Report
Report Number:
ETDE/JP-99736799
Reference Number:
SCA: 426000; 440800; PA: JP-98:0B0380; EDB-99:060466; SN: 99002080885
Resource Relation:
Other Information: PBD: May 1998
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; 44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; IMAGE PROCESSING; ELECTRON BEAM MACHINING; MAGNETIC FIELDS; LASERS; METALS; CRYSTALS; MICROSTRUCTURE; MATERIALS WORKING; MEASURING METHODS; CONTROL SYSTEMS; PLASMA
OSTI ID:
348832
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE99736799; TRN: JN98B0380
Availability:
OSTI as DE99736799
Submitting Site:
NEDO
Size:
829 p.
Announcement Date:

Citation Formats

Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`. Japan: N. p., 1998. Web.
Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`. Japan.
1998. "Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`." Japan.
@misc{etde_348832,
title = {Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`}
abstractNote = {For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.}
place = {Japan}
year = {1998}
month = {May}
}