Abstract
For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.
Citation Formats
None.
Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`.
Japan: N. p.,
1998.
Web.
None.
Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`.
Japan.
None.
1998.
"Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`."
Japan.
@misc{etde_348832,
title = {Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`}
author = {None}
abstractNote = {For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.}
place = {Japan}
year = {1998}
month = {May}
}
title = {Fiscal 1997 survey report. `Ultra high electronic technology development promotion project` under consignment from NEDO; 1997 nendo kenkyu seika hokokusho. Shin Energy Sangyo Gijutsu Sogo Kaihatsu Kiko itaku jigyo `Chosentan denshi gijutsu kaihatsu sokushin jigyo`}
author = {None}
abstractNote = {For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.}
place = {Japan}
year = {1998}
month = {May}
}