For the purpose of establishing ultra high technology of a next next generation level, the R and D was conducted of ultra fine processing process technology, technologies on limit measuring/analysis/control and new functional electronic materials. Themes of the R and D are electronic beam direct picture drawing system technology, ultra short wavelength electromagnetic radiation patterning/system technology, ultra fine sensitizing technology, ultra high accuracy shading system technology, ultra high tech plasma reactive measuring/analysis/control technology, ultra high tech cleaning basic technology, ultra high sensitivity medium technology, new functional element/film formation technology, etc. This R and D is a greatly influential basic research in the whole industrial field, and therefore, it is necessary that researchers standing foremost in each field of industry/university/government join the project and that various R and D infrastructures are made the most of. For this, the concentrated joint research method and the dispersed joint research method are combined, and the R and D is being conduced by equal partnership of each researcher. 421 refs., 823 figs., 91 tabs.