Abstract
The paper reports about diagnosis of a reactive plasma (Ar+N{sub 2}) discharge produced in a dc magnetron device dedicated to deposition of Ti N thin films. The diagnosis method used is optical emission spectroscopy. The investigation has been focused on Ti lines monitoring in the transition between metallic and ceramic magnetron operation mode. The obtained results are discussed in connection with the presence in the deposition chamber of a supplementary electrode acting as anode, which also determines the increase of discharge voltage, electron temperature, electron concentration and current densities on the substrate. (authors) 8 refs., 3 figs.
Braic, M;
Braic, V;
[1]
Zoita, C N;
Musa, G
[2]
- Institute of Optoelectronics, PO Box MG-22, R-76900 Bucharest (Romania)
- Plasma Physics and Nuclear Fusion Laboratory, Institute of Physics and Technology for Radiation Devices, PO Box MG-36, R-76900 Bucharest (Romania)
Citation Formats
Braic, M, Braic, V, Zoita, C N, and Musa, G.
Magnetron discharge-dedicated spectroscopic investigation for Ti N thin film deposition.
Romania: N. p.,
1996.
Web.
Braic, M, Braic, V, Zoita, C N, & Musa, G.
Magnetron discharge-dedicated spectroscopic investigation for Ti N thin film deposition.
Romania.
Braic, M, Braic, V, Zoita, C N, and Musa, G.
1996.
"Magnetron discharge-dedicated spectroscopic investigation for Ti N thin film deposition."
Romania.
@misc{etde_308626,
title = {Magnetron discharge-dedicated spectroscopic investigation for Ti N thin film deposition}
author = {Braic, M, Braic, V, Zoita, C N, and Musa, G}
abstractNote = {The paper reports about diagnosis of a reactive plasma (Ar+N{sub 2}) discharge produced in a dc magnetron device dedicated to deposition of Ti N thin films. The diagnosis method used is optical emission spectroscopy. The investigation has been focused on Ti lines monitoring in the transition between metallic and ceramic magnetron operation mode. The obtained results are discussed in connection with the presence in the deposition chamber of a supplementary electrode acting as anode, which also determines the increase of discharge voltage, electron temperature, electron concentration and current densities on the substrate. (authors) 8 refs., 3 figs.}
journal = []
issue = {3-4}
volume = {49}
journal type = {AC}
place = {Romania}
year = {1996}
month = {Dec}
}
title = {Magnetron discharge-dedicated spectroscopic investigation for Ti N thin film deposition}
author = {Braic, M, Braic, V, Zoita, C N, and Musa, G}
abstractNote = {The paper reports about diagnosis of a reactive plasma (Ar+N{sub 2}) discharge produced in a dc magnetron device dedicated to deposition of Ti N thin films. The diagnosis method used is optical emission spectroscopy. The investigation has been focused on Ti lines monitoring in the transition between metallic and ceramic magnetron operation mode. The obtained results are discussed in connection with the presence in the deposition chamber of a supplementary electrode acting as anode, which also determines the increase of discharge voltage, electron temperature, electron concentration and current densities on the substrate. (authors) 8 refs., 3 figs.}
journal = []
issue = {3-4}
volume = {49}
journal type = {AC}
place = {Romania}
year = {1996}
month = {Dec}
}