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Focused ion beam machining and deposition for nanofabrication

Abstract

Focused ion beam micromatching (FIBM) and focused ion beam deposition (FIBD) enable spatially selective, maskless, patterning and processing of materials at extremely high levels of resolution. State-of-the-art focused ion beam (FIB) columns based on high brightness liquid metal ion source (LMIS) technology are capable of forming probes with dimensions of order 10 nm with a lower limit on spot size set by the inherent energy spread of the LMIS and the chromatic aberration of ion optical systems. The combination of high lateral and depth resolution make FIBM and FIBD powerful tools for nanotechnology applications. In this paper we present some methods of controlling FIBM and FIBD processes for nanofabrication purposes and discuss their limitations. (author).
Authors:
Davies, S T; Khamsehpour, B [1] 
  1. Warwick Univ., Coventry (United Kingdom). Dept. of Engineering
Publication Date:
May 01, 1996
Product Type:
Journal Article
Reference Number:
SCA: 665300; PA: AIX-27:058810; EDB-96:124304; SN: 96001635947
Resource Relation:
Journal Name: Vacuum; Journal Volume: 47; Journal Issue: 5; Other Information: PBD: May 1996
Subject:
66 PHYSICS; ION BEAMS; MACHINING; SEMICONDUCTOR MATERIALS; ELECTRODEPOSITION; BEAM OPTICS; FOCUSING; LIQUID METALS; RESOLUTION; SEMICONDUCTOR DEVICES
OSTI ID:
265689
Country of Origin:
United Kingdom
Language:
English
Other Identifying Numbers:
Journal ID: VACUAV; ISSN 0042-207X; TRN: GB9600943058810
Submitting Site:
GBN
Size:
pp. 455-462
Announcement Date:

Citation Formats

Davies, S T, and Khamsehpour, B. Focused ion beam machining and deposition for nanofabrication. United Kingdom: N. p., 1996. Web. doi:10.1016/0042-207X(95)00235-9.
Davies, S T, & Khamsehpour, B. Focused ion beam machining and deposition for nanofabrication. United Kingdom. doi:10.1016/0042-207X(95)00235-9.
Davies, S T, and Khamsehpour, B. 1996. "Focused ion beam machining and deposition for nanofabrication." United Kingdom. doi:10.1016/0042-207X(95)00235-9. https://www.osti.gov/servlets/purl/10.1016/0042-207X(95)00235-9.
@misc{etde_265689,
title = {Focused ion beam machining and deposition for nanofabrication}
author = {Davies, S T, and Khamsehpour, B}
abstractNote = {Focused ion beam micromatching (FIBM) and focused ion beam deposition (FIBD) enable spatially selective, maskless, patterning and processing of materials at extremely high levels of resolution. State-of-the-art focused ion beam (FIB) columns based on high brightness liquid metal ion source (LMIS) technology are capable of forming probes with dimensions of order 10 nm with a lower limit on spot size set by the inherent energy spread of the LMIS and the chromatic aberration of ion optical systems. The combination of high lateral and depth resolution make FIBM and FIBD powerful tools for nanotechnology applications. In this paper we present some methods of controlling FIBM and FIBD processes for nanofabrication purposes and discuss their limitations. (author).}
doi = {10.1016/0042-207X(95)00235-9}
journal = {Vacuum}
issue = {5}
volume = {47}
journal type = {AC}
place = {United Kingdom}
year = {1996}
month = {May}
}