Abstract
The first part of this work is devoted to the study of dissociative processes in an oxygen glow discharge at low pressure (0,1-5 Torr, 1-80 mA). The kinetics of oxygen atoms has been determined supported by the measurements of atomic concentrations by VUV absorption spectroscopy and actinometry. The reaction coefficients for dissociative excitation and direct excitation of oxygen atoms have been calculated using the cross sections of the literature and a previously calculated EEDF. It has been demonstrated that dissociative excitation is negligible in respect with direct excitation for dissociation rates smaller than 2,5 %. An upper limit of 20 % for dissociative rates is observed. This limit has been explained by the increase of the atomic recombination at the discharge wall with increasing wall temperature. Using all these results, we have designed and optimized a source of oxygen atoms which has then been adapted on a MBE device. The spatial distribution of the atomic density has been measured in molecular jet by laser induced fluorescence (LIF) and Resonant Multi-Photon Ionization (RMPI). A stimulated emission has been evidenced and the coefficient for this process evaluated. A model for the effusion of atoms has been developed from which the flow of
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Citation Formats
Pagnon, Daniel.
Study of the Dissociative Processes in O{sub 2} Discharges. Development of an Atomic Oxygen Beam Source; Etude de la dissociation de O{sub 2} dans les decharges d'oxygene. Application a la realisation de sources d'atomes.
France: N. p.,
1992.
Web.
Pagnon, Daniel.
Study of the Dissociative Processes in O{sub 2} Discharges. Development of an Atomic Oxygen Beam Source; Etude de la dissociation de O{sub 2} dans les decharges d'oxygene. Application a la realisation de sources d'atomes.
France.
Pagnon, Daniel.
1992.
"Study of the Dissociative Processes in O{sub 2} Discharges. Development of an Atomic Oxygen Beam Source; Etude de la dissociation de O{sub 2} dans les decharges d'oxygene. Application a la realisation de sources d'atomes."
France.
@misc{etde_22602154,
title = {Study of the Dissociative Processes in O{sub 2} Discharges. Development of an Atomic Oxygen Beam Source; Etude de la dissociation de O{sub 2} dans les decharges d'oxygene. Application a la realisation de sources d'atomes}
author = {Pagnon, Daniel}
abstractNote = {The first part of this work is devoted to the study of dissociative processes in an oxygen glow discharge at low pressure (0,1-5 Torr, 1-80 mA). The kinetics of oxygen atoms has been determined supported by the measurements of atomic concentrations by VUV absorption spectroscopy and actinometry. The reaction coefficients for dissociative excitation and direct excitation of oxygen atoms have been calculated using the cross sections of the literature and a previously calculated EEDF. It has been demonstrated that dissociative excitation is negligible in respect with direct excitation for dissociation rates smaller than 2,5 %. An upper limit of 20 % for dissociative rates is observed. This limit has been explained by the increase of the atomic recombination at the discharge wall with increasing wall temperature. Using all these results, we have designed and optimized a source of oxygen atoms which has then been adapted on a MBE device. The spatial distribution of the atomic density has been measured in molecular jet by laser induced fluorescence (LIF) and Resonant Multi-Photon Ionization (RMPI). A stimulated emission has been evidenced and the coefficient for this process evaluated. A model for the effusion of atoms has been developed from which the flow of atoms on the sample can be predicted. This source has already been used in industrial MBE devices for in-situ oxidation of copper films, superconductors, and substrates for VLSI high speed applications. The methodology of this work and the diagnostics developed can be applied to other kinds of discharges, of other molecular gases, to design sources of atoms for the treatment of large area samples. (author) [French] Ce travail debute par l'etude de la dissociation dans une decharge luminescente d'oxygene a basse pression (0,1-5 torr, 1-80 ma). La cinetique des atomes d'oxygene a ete etablie a partir de la mesure des concentrations atomiques par spectroscopie d'absorption vuv et par actinometrie. Les coefficients de reaction pour l'excitation dissociative ou pour l'excitation directe de l'atome ont ete calcules a partir de sections efficaces publiees et d'une fonction de distribution en energie des electrons calculee. Nous avons montre que l'excitation dissociative est negligeable devant l'excitation directe pour un taux de dissociation inferieur a 2,5%. Nous avons montre que le taux de dissociation maximum de 20% obtenu etait limite par l'augmentation de la recombinaison atome-atome liee a l'echauffement de la paroi. Grace a ces resultats, une source continue d'atomes d'oxygene a ensuite ete realisee, ses parametres de fonctionnement optimises et l'etude de son implantation sur un bati MBE effectuee. La distribution spatiale de la densite d'atomes a ete mesuree dans le jet effusif par fluorescence induite a deux photons (lif) et par ionisation resonnante a trois photons (rmpi). Ces mesures laser ont permis d'observer l'existence d'une emission stimulee et d'evaluer son coefficient. Un modele de l'effusion des atomes a ete elabore qui permet de predire le flux d'atomes atteignant l'echantillon a traiter. Cette source a deja ete utilisee avec succes en milieu industriel pour oxyder in-situ des films de cuivre, de supraconducteurs, ou de substrats destines a la microelectronique rapide. La methode employee pour ce travail, ainsi que les diagnostics mis au point peuvent etre utilises dans d'autres types de plasmas, ou pour l'etude de la dissociation d'autres gaz moleculaires, afin de realiser des sources d'atomes pour le traitement de materiaux sur de plus grandes surfaces. (auteur)}
place = {France}
year = {1992}
month = {Sep}
}
title = {Study of the Dissociative Processes in O{sub 2} Discharges. Development of an Atomic Oxygen Beam Source; Etude de la dissociation de O{sub 2} dans les decharges d'oxygene. Application a la realisation de sources d'atomes}
author = {Pagnon, Daniel}
abstractNote = {The first part of this work is devoted to the study of dissociative processes in an oxygen glow discharge at low pressure (0,1-5 Torr, 1-80 mA). The kinetics of oxygen atoms has been determined supported by the measurements of atomic concentrations by VUV absorption spectroscopy and actinometry. The reaction coefficients for dissociative excitation and direct excitation of oxygen atoms have been calculated using the cross sections of the literature and a previously calculated EEDF. It has been demonstrated that dissociative excitation is negligible in respect with direct excitation for dissociation rates smaller than 2,5 %. An upper limit of 20 % for dissociative rates is observed. This limit has been explained by the increase of the atomic recombination at the discharge wall with increasing wall temperature. Using all these results, we have designed and optimized a source of oxygen atoms which has then been adapted on a MBE device. The spatial distribution of the atomic density has been measured in molecular jet by laser induced fluorescence (LIF) and Resonant Multi-Photon Ionization (RMPI). A stimulated emission has been evidenced and the coefficient for this process evaluated. A model for the effusion of atoms has been developed from which the flow of atoms on the sample can be predicted. This source has already been used in industrial MBE devices for in-situ oxidation of copper films, superconductors, and substrates for VLSI high speed applications. The methodology of this work and the diagnostics developed can be applied to other kinds of discharges, of other molecular gases, to design sources of atoms for the treatment of large area samples. (author) [French] Ce travail debute par l'etude de la dissociation dans une decharge luminescente d'oxygene a basse pression (0,1-5 torr, 1-80 ma). La cinetique des atomes d'oxygene a ete etablie a partir de la mesure des concentrations atomiques par spectroscopie d'absorption vuv et par actinometrie. Les coefficients de reaction pour l'excitation dissociative ou pour l'excitation directe de l'atome ont ete calcules a partir de sections efficaces publiees et d'une fonction de distribution en energie des electrons calculee. Nous avons montre que l'excitation dissociative est negligeable devant l'excitation directe pour un taux de dissociation inferieur a 2,5%. Nous avons montre que le taux de dissociation maximum de 20% obtenu etait limite par l'augmentation de la recombinaison atome-atome liee a l'echauffement de la paroi. Grace a ces resultats, une source continue d'atomes d'oxygene a ensuite ete realisee, ses parametres de fonctionnement optimises et l'etude de son implantation sur un bati MBE effectuee. La distribution spatiale de la densite d'atomes a ete mesuree dans le jet effusif par fluorescence induite a deux photons (lif) et par ionisation resonnante a trois photons (rmpi). Ces mesures laser ont permis d'observer l'existence d'une emission stimulee et d'evaluer son coefficient. Un modele de l'effusion des atomes a ete elabore qui permet de predire le flux d'atomes atteignant l'echantillon a traiter. Cette source a deja ete utilisee avec succes en milieu industriel pour oxyder in-situ des films de cuivre, de supraconducteurs, ou de substrats destines a la microelectronique rapide. La methode employee pour ce travail, ainsi que les diagnostics mis au point peuvent etre utilises dans d'autres types de plasmas, ou pour l'etude de la dissociation d'autres gaz moleculaires, afin de realiser des sources d'atomes pour le traitement de materiaux sur de plus grandes surfaces. (auteur)}
place = {France}
year = {1992}
month = {Sep}
}