You need JavaScript to view this

Photochemical and microbial degradation technologies to remove toxic chemicals

Abstract

An effort was made to apply photochemical degradation technology on biodegradation processes to increase the bioremediation potential of microbial actions. For this purpose, we have chosen Phanerochaete chrysosporium, a wood decaying white-rot fungus and a variety of chlorinated pesticides and aromatics as study materials. By using UV-irradiation and benomyl (a commonly used fungicide) as selection methods, a strain of UV-resistant P. chrysosporium was developed. This strain was found to be capable of rapidly degrading these chlorinated chemicals when they were incubated in N-deficient medium which received 1 hr/day of UV-irradiation. UV-irradiation either at 300 or 254 nm showed the beneficial effect of speeding up the rate of degradation on most of test chemicals with the exception of toxaphene and HCH (hexachlorocyclohexane). By adding fresh glucose to the medium it was possible to maintain high degradation capacity for several weeks.
Publication Date:
Jul 01, 1992
Product Type:
Journal Article
Resource Relation:
Journal Name: ACS symposium series; Journal Volume: 510; Journal Issue: 510; Other Information: FAO/AGRIS record; ARN: US9427929; Country of input: International Atomic Energy Agency (IAEA)
Subject:
54 ENVIRONMENTAL SCIENCES; AROMATICS; BIODEGRADATION; BIOREMEDIATION; CAPACITY; DECAY; EXCEPTIONS; FUNGICIDES; GLUCOSE; IRRADIATION; MATERIALS; ORGANIC CHLORINE COMPOUNDS; PHANEROCHAETE; PHOTOCHEMISTRY; PHOTOLYSIS; POLLUTANTS; POTENTIALS; STRAINS; TOXICITY; ULTRAVIOLET RADIATION; VELOCITY; WOOD
OSTI ID:
22314963
Country of Origin:
FAO
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0097-6156; TRN: XF14B6680021161
Submitting Site:
INIS
Size:
page(s) 201-209
Announcement Date:
Mar 03, 2015

Citation Formats

Matsumura, F., and Katayama, A. Photochemical and microbial degradation technologies to remove toxic chemicals. FAO: N. p., 1992. Web. doi:10.1021/bk-1992-0510.ch017.
Matsumura, F., & Katayama, A. Photochemical and microbial degradation technologies to remove toxic chemicals. FAO. doi:10.1021/bk-1992-0510.ch017.
Matsumura, F., and Katayama, A. 1992. "Photochemical and microbial degradation technologies to remove toxic chemicals." FAO. doi:10.1021/bk-1992-0510.ch017. https://www.osti.gov/servlets/purl/10.1021/bk-1992-0510.ch017.
@misc{etde_22314963,
title = {Photochemical and microbial degradation technologies to remove toxic chemicals}
author = {Matsumura, F., and Katayama, A.}
abstractNote = {An effort was made to apply photochemical degradation technology on biodegradation processes to increase the bioremediation potential of microbial actions. For this purpose, we have chosen Phanerochaete chrysosporium, a wood decaying white-rot fungus and a variety of chlorinated pesticides and aromatics as study materials. By using UV-irradiation and benomyl (a commonly used fungicide) as selection methods, a strain of UV-resistant P. chrysosporium was developed. This strain was found to be capable of rapidly degrading these chlorinated chemicals when they were incubated in N-deficient medium which received 1 hr/day of UV-irradiation. UV-irradiation either at 300 or 254 nm showed the beneficial effect of speeding up the rate of degradation on most of test chemicals with the exception of toxaphene and HCH (hexachlorocyclohexane). By adding fresh glucose to the medium it was possible to maintain high degradation capacity for several weeks.}
doi = {10.1021/bk-1992-0510.ch017}
journal = {ACS symposium series}
issue = {510}
volume = {510}
journal type = {AC}
place = {FAO}
year = {1992}
month = {Jul}
}