Abstract
Method of vacuum-arc deposition with ion implantation, (mode PBIID) obtained by coating of titanium nitride with a hardness of 62 GPa and reaches a high resistance to wear during the cutting. Submission of high-voltage pulses results in the formation of a stable structural state of titanium with cubic mononitride (structural type NaCl) crystal lattice. Comparison of the structure and stress state of titanium nitride coatings obtained in the usual way without additional supply of high-voltage pulses to the substrate during the deposition and the imposition of such pulses, shows that the influence of the pulse characteristics are a significant decrease in crystallite size and undirected growth at low significance of potential bias on substrate (from the 'floating' around -5 to -40 V), and a significant reduction of internal stresses.
Sobol', O. V.;
[1]
Andreev, A. A.;
Stolbovoj, V. A.;
[2]
Grigor'ev, V. F.;
Volosova, S. N.;
Aleshin, S. V.;
[3]
Gorban', V. F.
[4]
- National technical institute ''Kharkiv polytechnic institute'', Kharkiv (Ukraine)
- NSC ''Kharkov Institute of Physics and Technology'', Kharkiv (Ukraine)
- Moscow State University of Technology ''Stankin'', Moscow (Russian Federation)
- Frantsevich Institute for Problems of Material Science, Kyiv (Ukraine)
Citation Formats
Sobol', O. V., Andreev, A. A., Stolbovoj, V. A., Grigor'ev, V. F., Volosova, S. N., Aleshin, S. V., and Gorban', V. F.
Physical characteristics, structure and stress state of vacuum-arc TiN coating, deposition on the substrate when applying high-voltage pulse during the deposition; Mekhanicheskie kharakteristiki, struktura i napryazhennoe sostoyanie vakuumno-dugovykh TiN-pokrytij, osazhdennykh pri podache na podlozhku vysokovol'tnykh impul'sov v protsesse osazhdeniya.
Ukraine: N. p.,
2011.
Web.
Sobol', O. V., Andreev, A. A., Stolbovoj, V. A., Grigor'ev, V. F., Volosova, S. N., Aleshin, S. V., & Gorban', V. F.
Physical characteristics, structure and stress state of vacuum-arc TiN coating, deposition on the substrate when applying high-voltage pulse during the deposition; Mekhanicheskie kharakteristiki, struktura i napryazhennoe sostoyanie vakuumno-dugovykh TiN-pokrytij, osazhdennykh pri podache na podlozhku vysokovol'tnykh impul'sov v protsesse osazhdeniya.
Ukraine.
Sobol', O. V., Andreev, A. A., Stolbovoj, V. A., Grigor'ev, V. F., Volosova, S. N., Aleshin, S. V., and Gorban', V. F.
2011.
"Physical characteristics, structure and stress state of vacuum-arc TiN coating, deposition on the substrate when applying high-voltage pulse during the deposition; Mekhanicheskie kharakteristiki, struktura i napryazhennoe sostoyanie vakuumno-dugovykh TiN-pokrytij, osazhdennykh pri podache na podlozhku vysokovol'tnykh impul'sov v protsesse osazhdeniya."
Ukraine.
@misc{etde_22111841,
title = {Physical characteristics, structure and stress state of vacuum-arc TiN coating, deposition on the substrate when applying high-voltage pulse during the deposition; Mekhanicheskie kharakteristiki, struktura i napryazhennoe sostoyanie vakuumno-dugovykh TiN-pokrytij, osazhdennykh pri podache na podlozhku vysokovol'tnykh impul'sov v protsesse osazhdeniya}
author = {Sobol', O. V., Andreev, A. A., Stolbovoj, V. A., Grigor'ev, V. F., Volosova, S. N., Aleshin, S. V., and Gorban', V. F.}
abstractNote = {Method of vacuum-arc deposition with ion implantation, (mode PBIID) obtained by coating of titanium nitride with a hardness of 62 GPa and reaches a high resistance to wear during the cutting. Submission of high-voltage pulses results in the formation of a stable structural state of titanium with cubic mononitride (structural type NaCl) crystal lattice. Comparison of the structure and stress state of titanium nitride coatings obtained in the usual way without additional supply of high-voltage pulses to the substrate during the deposition and the imposition of such pulses, shows that the influence of the pulse characteristics are a significant decrease in crystallite size and undirected growth at low significance of potential bias on substrate (from the 'floating' around -5 to -40 V), and a significant reduction of internal stresses.}
journal = []
issue = {4-98/74}
journal type = {AC}
place = {Ukraine}
year = {2011}
month = {Jul}
}
title = {Physical characteristics, structure and stress state of vacuum-arc TiN coating, deposition on the substrate when applying high-voltage pulse during the deposition; Mekhanicheskie kharakteristiki, struktura i napryazhennoe sostoyanie vakuumno-dugovykh TiN-pokrytij, osazhdennykh pri podache na podlozhku vysokovol'tnykh impul'sov v protsesse osazhdeniya}
author = {Sobol', O. V., Andreev, A. A., Stolbovoj, V. A., Grigor'ev, V. F., Volosova, S. N., Aleshin, S. V., and Gorban', V. F.}
abstractNote = {Method of vacuum-arc deposition with ion implantation, (mode PBIID) obtained by coating of titanium nitride with a hardness of 62 GPa and reaches a high resistance to wear during the cutting. Submission of high-voltage pulses results in the formation of a stable structural state of titanium with cubic mononitride (structural type NaCl) crystal lattice. Comparison of the structure and stress state of titanium nitride coatings obtained in the usual way without additional supply of high-voltage pulses to the substrate during the deposition and the imposition of such pulses, shows that the influence of the pulse characteristics are a significant decrease in crystallite size and undirected growth at low significance of potential bias on substrate (from the 'floating' around -5 to -40 V), and a significant reduction of internal stresses.}
journal = []
issue = {4-98/74}
journal type = {AC}
place = {Ukraine}
year = {2011}
month = {Jul}
}