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Pt-Al{sub 2}O{sub 3} dual layer atomic layer deposition coating in high aspect ratio nanopores

Abstract

Functional nanoporous materials are promising for a number of applications ranging from selective biofiltration to fuel cell electrodes. This work reports the functionalization of nanoporous membranes using atomic layer deposition (ALD). ALD is used to conformally deposit platinum (Pt) and aluminum oxide (Al{sub 2}O{sub 3}) on Pt in nanopores to form a metal-insulator stack inside the nanopore. Deposition of these materials inside nanopores allows the addition of extra functionalities to nanoporous materials such as anodic aluminum oxide (AAO) membranes. Conformal deposition of Pt on such materials enables increased performances for electrochemical sensing applications or fuel cell electrodes. An additional conformal Al{sub 2}O{sub 3} layer on such a Pt film forms a metal-insulator-electrolyte system, enabling field effect control of the nanofluidic properties of the membrane. This opens novel possibilities in electrically controlled biofiltration. In this work, the deposition of these two materials on AAO membranes is investigated theoretically and experimentally. Successful process parameters are proposed for a reliable and cost-effective conformal deposition on high aspect ratio three-dimensional nanostructures. A device consisting of a silicon chip supporting an AAO membrane of 6 mm diameter and 1.3 {mu}m thickness with 80 nm diameter pores is fabricated. The pore diameter is reduced to 40  More>>
Authors:
Pardon, Gaspard; Gatty, Hithesh K; Stemme, Goeran; Wijngaart, Wouter van der; Roxhed, Niclas [1] 
  1. KTH Royal Institute of Technology, School of Electrical Engineering, Micro and Nanosystems, Osquldas Vaeg 10, SE-10044 Stockholm (Sweden)
Publication Date:
Jan 11, 2013
Product Type:
Journal Article
Resource Relation:
Journal Name: Nanotechnology (Print); Journal Volume: 24; Journal Issue: 1; Other Information: Country of input: International Atomic Energy Agency (IAEA)
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; ALUMINIUM OXIDES; ASPECT RATIO; COST; DEPOSITION; DEPOSITS; ELECTROCHEMISTRY; ELECTRODES; ELECTROLYTES; FILMS; FUEL CELLS; LAYERS; NANOSTRUCTURES; PERFORMANCE; PLATINUM; SILICON
OSTI ID:
22087563
Country of Origin:
United Kingdom
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0957-4484; TRN: GB13O3330046287
Availability:
Available from http://dx.doi.org/10.1088/0957-4484/24/1/015602
Submitting Site:
INIS
Size:
[11 page(s)]
Announcement Date:
Apr 25, 2013

Citation Formats

Pardon, Gaspard, Gatty, Hithesh K, Stemme, Goeran, Wijngaart, Wouter van der, and Roxhed, Niclas. Pt-Al{sub 2}O{sub 3} dual layer atomic layer deposition coating in high aspect ratio nanopores. United Kingdom: N. p., 2013. Web. doi:10.1088/0957-4484/24/1/015602.
Pardon, Gaspard, Gatty, Hithesh K, Stemme, Goeran, Wijngaart, Wouter van der, & Roxhed, Niclas. Pt-Al{sub 2}O{sub 3} dual layer atomic layer deposition coating in high aspect ratio nanopores. United Kingdom. doi:10.1088/0957-4484/24/1/015602.
Pardon, Gaspard, Gatty, Hithesh K, Stemme, Goeran, Wijngaart, Wouter van der, and Roxhed, Niclas. 2013. "Pt-Al{sub 2}O{sub 3} dual layer atomic layer deposition coating in high aspect ratio nanopores." United Kingdom. doi:10.1088/0957-4484/24/1/015602. https://www.osti.gov/servlets/purl/10.1088/0957-4484/24/1/015602.
@misc{etde_22087563,
title = {Pt-Al{sub 2}O{sub 3} dual layer atomic layer deposition coating in high aspect ratio nanopores}
author = {Pardon, Gaspard, Gatty, Hithesh K, Stemme, Goeran, Wijngaart, Wouter van der, and Roxhed, Niclas}
abstractNote = {Functional nanoporous materials are promising for a number of applications ranging from selective biofiltration to fuel cell electrodes. This work reports the functionalization of nanoporous membranes using atomic layer deposition (ALD). ALD is used to conformally deposit platinum (Pt) and aluminum oxide (Al{sub 2}O{sub 3}) on Pt in nanopores to form a metal-insulator stack inside the nanopore. Deposition of these materials inside nanopores allows the addition of extra functionalities to nanoporous materials such as anodic aluminum oxide (AAO) membranes. Conformal deposition of Pt on such materials enables increased performances for electrochemical sensing applications or fuel cell electrodes. An additional conformal Al{sub 2}O{sub 3} layer on such a Pt film forms a metal-insulator-electrolyte system, enabling field effect control of the nanofluidic properties of the membrane. This opens novel possibilities in electrically controlled biofiltration. In this work, the deposition of these two materials on AAO membranes is investigated theoretically and experimentally. Successful process parameters are proposed for a reliable and cost-effective conformal deposition on high aspect ratio three-dimensional nanostructures. A device consisting of a silicon chip supporting an AAO membrane of 6 mm diameter and 1.3 {mu}m thickness with 80 nm diameter pores is fabricated. The pore diameter is reduced to 40 nm by a conformal deposition of 11 nm Pt and 9 nm Al{sub 2}O{sub 3} using ALD. (paper)}
doi = {10.1088/0957-4484/24/1/015602}
journal = {Nanotechnology (Print)}
issue = {1}
volume = {24}
journal type = {AC}
place = {United Kingdom}
year = {2013}
month = {Jan}
}