You need JavaScript to view this

Pentacene based thin film transistors with high-k dielectric Nd{sub 2}O{sub 3} as a gate insulator

Abstract

We have investigated the pentacene based Organic Thin Film Transistors (OTFTs) with high-k dielectric Nd{sub 2}O{sub 3}. Use of high dielectric constant (high-k) gate insulator Nd{sub 2}O{sub 3} reduces the threshold voltage and sub threshold swing of the OTFTs. The calculated threshold voltage -2.2V and sub-threshold swing 1V/decade, current ON-OFF ratio is 1.7 X 10{sup 4} and mobility is 0.13cm{sup 2}/V.s. Pentacene film is deposited on Nd{sub 2}O{sub 3} surface using two step deposition method. Deposited pentacene film is found poly crystalline in nature. (author)
Authors:
Sarma, R; Saikia, D; [1]  Saikia, Puja; Saikia, P K; Baishya, B [2] 
  1. J B College, Jorhat, Assam (India). Dept. of Physics. Thin Film Lab.
  2. Dibrugarh University, Dibrugarh, Assam (India)
Publication Date:
Sep 15, 2010
Product Type:
Journal Article
Resource Relation:
Journal Name: Brazilian Journal of Physics; Journal Volume: 40; Journal Issue: 3
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; MOBILITY; NEODYMIUM OXIDES; PENTACENE; PERMITTIVITY; THIN FILMS; TRANSISTORS; AROMATICS; CHALCOGENIDES; CONDENSED AROMATICS; CURRENTS; DIELECTRIC PROPERTIES; ELECTRICAL PROPERTIES; FILMS; HYDROCARBONS; MATERIALS; NEODYMIUM COMPOUNDS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RARE EARTH COMPOUNDS; SEMICONDUCTOR DEVICES
OSTI ID:
21397731
Country of Origin:
Brazil
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0103-9733; BJPHE6; TRN: BR1049602125149
Availability:
Also available from http://www.scielo.br/pdf/bjp/v40n3/a19v40n3.pdf;
Submitting Site:
BRN
Size:
page(s) 357-360
Announcement Date:
Mar 03, 2011

Citation Formats

Sarma, R, Saikia, D, Saikia, Puja, Saikia, P K, and Baishya, B. Pentacene based thin film transistors with high-k dielectric Nd{sub 2}O{sub 3} as a gate insulator. Brazil: N. p., 2010. Web. doi:10.1590/S0103-97332010000300019.
Sarma, R, Saikia, D, Saikia, Puja, Saikia, P K, & Baishya, B. Pentacene based thin film transistors with high-k dielectric Nd{sub 2}O{sub 3} as a gate insulator. Brazil. https://doi.org/10.1590/S0103-97332010000300019
Sarma, R, Saikia, D, Saikia, Puja, Saikia, P K, and Baishya, B. 2010. "Pentacene based thin film transistors with high-k dielectric Nd{sub 2}O{sub 3} as a gate insulator." Brazil. https://doi.org/10.1590/S0103-97332010000300019.
@misc{etde_21397731,
title = {Pentacene based thin film transistors with high-k dielectric Nd{sub 2}O{sub 3} as a gate insulator}
author = {Sarma, R, Saikia, D, Saikia, Puja, Saikia, P K, and Baishya, B}
abstractNote = {We have investigated the pentacene based Organic Thin Film Transistors (OTFTs) with high-k dielectric Nd{sub 2}O{sub 3}. Use of high dielectric constant (high-k) gate insulator Nd{sub 2}O{sub 3} reduces the threshold voltage and sub threshold swing of the OTFTs. The calculated threshold voltage -2.2V and sub-threshold swing 1V/decade, current ON-OFF ratio is 1.7 X 10{sup 4} and mobility is 0.13cm{sup 2}/V.s. Pentacene film is deposited on Nd{sub 2}O{sub 3} surface using two step deposition method. Deposited pentacene film is found poly crystalline in nature. (author)}
doi = {10.1590/S0103-97332010000300019}
journal = []
issue = {3}
volume = {40}
place = {Brazil}
year = {2010}
month = {Sep}
}