Abstract
We report the fabrication of moth-eye antireflection nanostructures on AlInP compound commonly used as a window layer in high-efficiency multijunction solar cells. The broadband antireflective nanostructures were fabricated by nanoimprint lithography directly on molecular beam epitaxy grown AlInP/GaAs surface. At normal incidence, the structures exhibited an average reflectivity of 2.7% measured in a spectral range 450-1650 nm. Photoluminescence measurements of the emission from GaAs substrate suggest that the optical losses associated with the moth-eye pattern are low. Nanoimprint lithography offers a cost-effective approach to fabricate broadband antireflection coatings required in III-V high-efficiency multijunction solar cells. (author)
Tommila, J;
Polojaervi, V;
Aho, A;
Tukiainen, A;
Viheriaelae, J;
Salmi, J;
Schramm, A;
Kontio, J M;
Turtiainen, A;
Niemi, T;
Guina, M
[1]
- Optoelectronics Research Centre, Tampere University of Technology, Korkeakoulunkatu 3, 33720, Tampere, P.O. Box 692, 33101 Tampere (Finland)
Citation Formats
Tommila, J, Polojaervi, V, Aho, A, Tukiainen, A, Viheriaelae, J, Salmi, J, Schramm, A, Kontio, J M, Turtiainen, A, Niemi, T, and Guina, M.
Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography.
Netherlands: N. p.,
2010.
Web.
doi:10.1016/J.SOLMAT.2010.05.053.
Tommila, J, Polojaervi, V, Aho, A, Tukiainen, A, Viheriaelae, J, Salmi, J, Schramm, A, Kontio, J M, Turtiainen, A, Niemi, T, & Guina, M.
Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography.
Netherlands.
https://doi.org/10.1016/J.SOLMAT.2010.05.053
Tommila, J, Polojaervi, V, Aho, A, Tukiainen, A, Viheriaelae, J, Salmi, J, Schramm, A, Kontio, J M, Turtiainen, A, Niemi, T, and Guina, M.
2010.
"Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography."
Netherlands.
https://doi.org/10.1016/J.SOLMAT.2010.05.053.
@misc{etde_21338211,
title = {Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography}
author = {Tommila, J, Polojaervi, V, Aho, A, Tukiainen, A, Viheriaelae, J, Salmi, J, Schramm, A, Kontio, J M, Turtiainen, A, Niemi, T, and Guina, M}
abstractNote = {We report the fabrication of moth-eye antireflection nanostructures on AlInP compound commonly used as a window layer in high-efficiency multijunction solar cells. The broadband antireflective nanostructures were fabricated by nanoimprint lithography directly on molecular beam epitaxy grown AlInP/GaAs surface. At normal incidence, the structures exhibited an average reflectivity of 2.7% measured in a spectral range 450-1650 nm. Photoluminescence measurements of the emission from GaAs substrate suggest that the optical losses associated with the moth-eye pattern are low. Nanoimprint lithography offers a cost-effective approach to fabricate broadband antireflection coatings required in III-V high-efficiency multijunction solar cells. (author)}
doi = {10.1016/J.SOLMAT.2010.05.053}
journal = []
issue = {10}
volume = {94}
place = {Netherlands}
year = {2010}
month = {Oct}
}
title = {Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography}
author = {Tommila, J, Polojaervi, V, Aho, A, Tukiainen, A, Viheriaelae, J, Salmi, J, Schramm, A, Kontio, J M, Turtiainen, A, Niemi, T, and Guina, M}
abstractNote = {We report the fabrication of moth-eye antireflection nanostructures on AlInP compound commonly used as a window layer in high-efficiency multijunction solar cells. The broadband antireflective nanostructures were fabricated by nanoimprint lithography directly on molecular beam epitaxy grown AlInP/GaAs surface. At normal incidence, the structures exhibited an average reflectivity of 2.7% measured in a spectral range 450-1650 nm. Photoluminescence measurements of the emission from GaAs substrate suggest that the optical losses associated with the moth-eye pattern are low. Nanoimprint lithography offers a cost-effective approach to fabricate broadband antireflection coatings required in III-V high-efficiency multijunction solar cells. (author)}
doi = {10.1016/J.SOLMAT.2010.05.053}
journal = []
issue = {10}
volume = {94}
place = {Netherlands}
year = {2010}
month = {Oct}
}