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Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques

Abstract

We have investigated the formation of the interfacial chemical mixing in Mo/Ni multilayers, and particularly the influence of ballistic effects during the growth. For this purpose, hetero-epitaxial b.c.c./f.c.c. Mo(110)/Ni(111) multilayers were grown by two deposition methods: thermal evaporation and direct ion beam sputtering. As a preliminary, an accurate description of the stress state in pure sputtered Mo thin films was required. Microstructural and stress state analyses were essentially carried out by X-ray diffraction, and ion irradiation was used as a powerful tool to control the stress level. We showed that thermal evaporated thin films exhibit a weak tensile growth stress ({approx} 0.6 GPa) that can be accounted for by the grain boundary relaxation model, whereas sputtered thin films develop large compressive growth stress (- 2 to - 4 GPa). This latter results from the bombardment of the growing film by the energetic particles involved during the sputtering process (atomic peening phenomenon), which induces the formation of defects in the layers, generating volume distortions. We thus developed a stress model that includes a hydrostatic stress component to account for these volume strains. This model allowed us to determine the 'unstressed and free of defects lattice parameter' a{sub 0}, solely linked to  More>>
Authors:
Publication Date:
Sep 15, 2006
Product Type:
Thesis/Dissertation
Report Number:
FRNC-TH-7032
Resource Relation:
Other Information: TH: These ecole doctorale: sciences pour l'ingenieur. Domaine de recherche: milieux denses et materiaux; 260 refs.; Also available from Service commun de la documentation. Section Sciences, Techniques et Sport, 40, avenue du Recteur Pineau BP 605 Batiment B, 86022 - Poitiers Cedex (France)
Subject:
36 MATERIALS SCIENCE; ENERGY BEAM DEPOSITION; MICROSTRUCTURE; MOLYBDENUM; PHYSICAL RADIATION EFFECTS; SPUTTERING; STRESS ANALYSIS; TENSILE PROPERTIES; THIN FILMS
OSTI ID:
20953812
Research Organizations:
Poitiers Univ., 86 (France)
Country of Origin:
France
Language:
French
Other Identifying Numbers:
TRN: FR0702020105124
Availability:
Available from INIS in electronic form
Submitting Site:
FRN
Size:
240 pages
Announcement Date:
Dec 21, 2007

Citation Formats

Debelle, A. Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques. France: N. p., 2006. Web.
Debelle, A. Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques. France.
Debelle, A. 2006. "Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques." France.
@misc{etde_20953812,
title = {Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques}
author = {Debelle, A}
abstractNote = {We have investigated the formation of the interfacial chemical mixing in Mo/Ni multilayers, and particularly the influence of ballistic effects during the growth. For this purpose, hetero-epitaxial b.c.c./f.c.c. Mo(110)/Ni(111) multilayers were grown by two deposition methods: thermal evaporation and direct ion beam sputtering. As a preliminary, an accurate description of the stress state in pure sputtered Mo thin films was required. Microstructural and stress state analyses were essentially carried out by X-ray diffraction, and ion irradiation was used as a powerful tool to control the stress level. We showed that thermal evaporated thin films exhibit a weak tensile growth stress ({approx} 0.6 GPa) that can be accounted for by the grain boundary relaxation model, whereas sputtered thin films develop large compressive growth stress (- 2 to - 4 GPa). This latter results from the bombardment of the growing film by the energetic particles involved during the sputtering process (atomic peening phenomenon), which induces the formation of defects in the layers, generating volume distortions. We thus developed a stress model that includes a hydrostatic stress component to account for these volume strains. This model allowed us to determine the 'unstressed and free of defects lattice parameter' a{sub 0}, solely linked to chemical effects. For epitaxial Mo layers, it was possible to separate coherency stress from growth stress due to their distinct kinetic evolution during ion irradiation. Therefore, the stress analysis enabled us to determine the a{sub 0} values in Mo sub-layers of Mo/Ni superlattices. A tendency to the formation of an interfacial alloy is observed independently of the growth conditions, which suggests that thermodynamic forces favour the exchange mechanism. However, the extent of the intermixing effect is clearly enhanced by ballistic effects. (author)}
place = {France}
year = {2006}
month = {Sep}
}