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Determination Of Refractive Index And Reflectivity Of Thin Layer With Optical Absorption Method; PENENTUAN INDEKS BIAS DAN REFLEKTIVITAS LAPISAN TIPIS DENGAN METODA SERAPAN OPTIK

Abstract

. The refractive index and reflectivity of ASi:H and Si Ox thin layer have been observed by optical absorption methods. Measurement has been done after the preparation of optical system which consists of a halogen lamp light source, monochromator, sample and light detector. The Monochromator output showed that measured halogen lamp spectrum light is between 470 nm -750 nm. The maximum voltage of halogen lamp is 220 Volt, the output light increases in intensity while the wave length increases. The inclination of intensity decrease at the wave length of 725 nm. The result of the calculation of refractive index varies in accordance with the wave length. The average refractive index of ASi:H is nf a = 1.753. The total reflectivity of air-thin layer-substrate is Rt a = 0.315. The refractive index of Si Ox sample is nf b2.182 and the total reflectivity is Rt b=O,514.
Authors:
Hariyanto, Sigit; Budianto, Anwar; Subarkah,; Atmono, Trimarji [1] 
  1. Yogyakarta Nuclear Research Center, National Nuclear Energy Agency, Yogyakarta (Indonesia)
Publication Date:
Apr 15, 1996
Product Type:
Conference
Report Number:
INIS-ID-035
Resource Relation:
Conference: Scientific Meeting and Presentation on Basic Research in Nuclear Science and Technology, Pertemuan dan Presentasi Ilmiah Penelitian Dasar Ilmu Pengetahuan Teknologi Nuklir, Yogyakarta (Indonesia), 23-25 Apr 1996; Other Information: 5 refs.; tabs.; 9 figs; Related Information: In: Proceeding of the Scientific Meeting and Presentation on Basic Research in Nuclear Science and Technology. Part I : Physics, Reactor Physics and Nuclear Instrumentation, Pertemuan dan Presentasi Ilmiah Penelitian Dasar Ilmu Pengetahuan Teknologi Nuklir. Buku I: Fisika, Fisika Reaktor dan Instrumentasi Nuklir, by Sudjatmoko; Karmanto, Eko Edy; Supartini, Endang [Yogyakarta Nuclear Research Center, National Nuclear Energy Agency, Yogyakarta (Indonesia)], 285 pages.
Subject:
36 MATERIALS SCIENCE; ABSORPTION; HALOGENS; MONOCHROMATORS; OPTICS; REFLECTIVITY; REFRACTIVE INDEX; SILICON; THIN FILMS; TRANSMISSION; VISIBLE RADIATION; WAVELENGTHS
OSTI ID:
20785175
Research Organizations:
Yogyakarta Nuclear Research Center, National Nuclear Energy Agency, Yogyakarta (Indonesia)
Country of Origin:
Indonesia
Language:
Indonesian
Other Identifying Numbers:
Other: ISSN 0216-3128; TRN: ID0600146088882
Availability:
Available from INIS in electronic form; Available from Center for Development of Informatics and Computation Technology, National Nuclear Energy Agency, Puspiptek Area, Fax. 62-21-7560923, PO BOX 4274, Jakarta (ID)
Submitting Site:
INIS
Size:
page(s) 87-92
Announcement Date:
Jan 12, 2010

Citation Formats

Hariyanto, Sigit, Budianto, Anwar, Subarkah,, and Atmono, Trimarji. Determination Of Refractive Index And Reflectivity Of Thin Layer With Optical Absorption Method; PENENTUAN INDEKS BIAS DAN REFLEKTIVITAS LAPISAN TIPIS DENGAN METODA SERAPAN OPTIK. Indonesia: N. p., 1996. Web.
Hariyanto, Sigit, Budianto, Anwar, Subarkah,, & Atmono, Trimarji. Determination Of Refractive Index And Reflectivity Of Thin Layer With Optical Absorption Method; PENENTUAN INDEKS BIAS DAN REFLEKTIVITAS LAPISAN TIPIS DENGAN METODA SERAPAN OPTIK. Indonesia.
Hariyanto, Sigit, Budianto, Anwar, Subarkah,, and Atmono, Trimarji. 1996. "Determination Of Refractive Index And Reflectivity Of Thin Layer With Optical Absorption Method; PENENTUAN INDEKS BIAS DAN REFLEKTIVITAS LAPISAN TIPIS DENGAN METODA SERAPAN OPTIK." Indonesia.
@misc{etde_20785175,
title = {Determination Of Refractive Index And Reflectivity Of Thin Layer With Optical Absorption Method; PENENTUAN INDEKS BIAS DAN REFLEKTIVITAS LAPISAN TIPIS DENGAN METODA SERAPAN OPTIK}
author = {Hariyanto, Sigit, Budianto, Anwar, Subarkah,, and Atmono, Trimarji}
abstractNote = {. The refractive index and reflectivity of ASi:H and Si Ox thin layer have been observed by optical absorption methods. Measurement has been done after the preparation of optical system which consists of a halogen lamp light source, monochromator, sample and light detector. The Monochromator output showed that measured halogen lamp spectrum light is between 470 nm -750 nm. The maximum voltage of halogen lamp is 220 Volt, the output light increases in intensity while the wave length increases. The inclination of intensity decrease at the wave length of 725 nm. The result of the calculation of refractive index varies in accordance with the wave length. The average refractive index of ASi:H is nf a = 1.753. The total reflectivity of air-thin layer-substrate is Rt a = 0.315. The refractive index of Si Ox sample is nf b2.182 and the total reflectivity is Rt b=O,514.}
place = {Indonesia}
year = {1996}
month = {Apr}
}