Abstract
The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, authors need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, authors apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened.
Guling, Zhang;
Jiuli, Wang;
Yuanfu, Liu;
Songhua, Fan;
Chizi, Liu;
Size, Yang;
[1]
Xueming, Li;
Xingfang, Wu
[2]
- Chinese Academy of Sciences, Beijing (China). Inst. of Physics
- Beijing Science and Technology Univ., Beijing (China). School of Materials Science and Engineering
Citation Formats
Guling, Zhang, Jiuli, Wang, Yuanfu, Liu, Songhua, Fan, Chizi, Liu, Size, Yang, Xueming, Li, and Xingfang, Wu.
Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method.
China: N. p.,
2004.
Web.
doi:10.1088/0256-307X/21/6/038.
Guling, Zhang, Jiuli, Wang, Yuanfu, Liu, Songhua, Fan, Chizi, Liu, Size, Yang, Xueming, Li, & Xingfang, Wu.
Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method.
China.
https://doi.org/10.1088/0256-307X/21/6/038
Guling, Zhang, Jiuli, Wang, Yuanfu, Liu, Songhua, Fan, Chizi, Liu, Size, Yang, Xueming, Li, and Xingfang, Wu.
2004.
"Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method."
China.
https://doi.org/10.1088/0256-307X/21/6/038.
@misc{etde_20620013,
title = {Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method}
author = {Guling, Zhang, Jiuli, Wang, Yuanfu, Liu, Songhua, Fan, Chizi, Liu, Size, Yang, Xueming, Li, and Xingfang, Wu}
abstractNote = {The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, authors need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, authors apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened.}
doi = {10.1088/0256-307X/21/6/038}
journal = []
issue = {6}
volume = {21}
journal type = {AC}
place = {China}
year = {2004}
month = {Jun}
}
title = {Shadow effect and its revisal in grid-enhanced plasma source with ion implantation method}
author = {Guling, Zhang, Jiuli, Wang, Yuanfu, Liu, Songhua, Fan, Chizi, Liu, Size, Yang, Xueming, Li, and Xingfang, Wu}
abstractNote = {The implanting voltage, gas pressure and the grid electrode radius are the key parameters influencing the surface grid shadow effect that has been observed in our grid-enhanced plasma source ion implantation experiment. To reduce the shadow effect and obtain a corresponding better implantation uniformity of sample surfaces, authors need to use lower implanting voltage, higher gas pressure and smaller grid radius. Furthermore, authors apply an axial magnetic field to increase the plasma density inside the tube and to mix the plasma outside the grid, so that the shadow effect of sample surfaces can be weakened.}
doi = {10.1088/0256-307X/21/6/038}
journal = []
issue = {6}
volume = {21}
journal type = {AC}
place = {China}
year = {2004}
month = {Jun}
}