Abstract
Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements ({delta}) are presented. Comparing {delta}{sub 0} between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 {mu}m below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of {delta} on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.
Braga, D;
Poumellec, B;
Cannas, V;
Blaise, G;
Ren, Y;
Kristensen, M;
[1]
Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France);
Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France);
Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)]
- Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France)
Citation Formats
Braga, D, Poumellec, B, Cannas, V, Blaise, G, Ren, Y, Kristensen, M, Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), and Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)].
Secondary electron emission yield on poled silica based thick films.
United States: N. p.,
2004.
Web.
doi:10.1063/1.1758315.
Braga, D, Poumellec, B, Cannas, V, Blaise, G, Ren, Y, Kristensen, M, Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), & Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)].
Secondary electron emission yield on poled silica based thick films.
United States.
https://doi.org/10.1063/1.1758315
Braga, D, Poumellec, B, Cannas, V, Blaise, G, Ren, Y, Kristensen, M, Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), and Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)].
2004.
"Secondary electron emission yield on poled silica based thick films."
United States.
https://doi.org/10.1063/1.1758315.
@misc{etde_20619042,
title = {Secondary electron emission yield on poled silica based thick films}
author = {Braga, D, Poumellec, B, Cannas, V, Blaise, G, Ren, Y, Kristensen, M, Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), and Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)]}
abstractNote = {Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements ({delta}) are presented. Comparing {delta}{sub 0} between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 {mu}m below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of {delta} on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.}
doi = {10.1063/1.1758315}
journal = []
issue = {1}
volume = {96}
journal type = {AC}
place = {United States}
year = {2004}
month = {Jul}
}
title = {Secondary electron emission yield on poled silica based thick films}
author = {Braga, D, Poumellec, B, Cannas, V, Blaise, G, Ren, Y, Kristensen, M, Laboratoire de Physico-Chimie de l'Etat Solide, UMR8648 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), Physique des Solides, UMR8502 CNRS-UPS, Universite de Paris Sud, F-91405 Orsay Cedex (France), and Research Center COM, Technical University of Denmark, DK-2800 Kgs. Lyngby (Denmark)]}
abstractNote = {Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements ({delta}) are presented. Comparing {delta}{sub 0} between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 {mu}m below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of {delta} on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.}
doi = {10.1063/1.1758315}
journal = []
issue = {1}
volume = {96}
journal type = {AC}
place = {United States}
year = {2004}
month = {Jul}
}