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Boron ions interaction with Si(100)-2x4 surfaces

Abstract

No abstract prepared.
Authors:
Yanovs'ky, O; Anan'yina, O [1] 
  1. Zaporozhye State University, Zaporozhye, (Ukraine)
Publication Date:
Jul 01, 2004
Product Type:
Conference
Resource Relation:
Conference: 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, Kazimierz Dolny (Poland), 14-17 Jun 2004; Other Information: 2 refs, 1 fig; PBD: 2004; Related Information: In: Abstracts of 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, 257 pages.
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BINDING ENERGY; BORON IONS; INTERATOMIC DISTANCES; ION BEAMS; ION IMPLANTATION; IRRADIATION; PHYSICAL RADIATION EFFECTS; SILICON; SIMULATION
OSTI ID:
20616906
Research Organizations:
Maria Curie-Sklodowska Univ., Lublin (Poland); Technical University, Lublin (Poland); Wroclaw University of Technology, Wroclaw (Poland); Association of Polish Electrical Engineers, Lublin (Poland)
Country of Origin:
Poland
Language:
English
Other Identifying Numbers:
TRN: PL0500591060135
Availability:
Available at Institute of Electronic Materials Technology, ul. Wolczynska 133, 01-910 Warsaw, Poland
Submitting Site:
INIS
Size:
page(s) 158
Announcement Date:
Aug 21, 2005

Citation Formats

Yanovs'ky, O, and Anan'yina, O. Boron ions interaction with Si(100)-2x4 surfaces. Poland: N. p., 2004. Web.
Yanovs'ky, O, & Anan'yina, O. Boron ions interaction with Si(100)-2x4 surfaces. Poland.
Yanovs'ky, O, and Anan'yina, O. 2004. "Boron ions interaction with Si(100)-2x4 surfaces." Poland.
@misc{etde_20616906,
title = {Boron ions interaction with Si(100)-2x4 surfaces}
author = {Yanovs'ky, O, and Anan'yina, O}
abstractNote = {No abstract prepared.}
place = {Poland}
year = {2004}
month = {Jul}
}