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Some aspects of creation of thin Si{sub x}C{sub y} gradient coating layers by dual beam IBAD method

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Abstract

No abstract prepared.
Authors:
Rajchel, B; Mitura, M; [1]  Rakowski, W; [2]  Rakowska, A; [2]  Weselucha-Birczynska, A; [3]  Proniewicz, L M [3] 
  1. The Henryk Niewodniczanski Institute of Nuclear Physics, Polish Academy of Science, Cracow (Poland)
  2. AGH University of Science and Technology, Cracow (Poland)
  3. Jagiellonian University, Regional Laboratory of Physicochemical Analyses and Structural Research, Cracow (Poland)
Publication Date:
Jul 01, 2004
Product Type:
Conference
Resource Relation:
Conference: 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, Kazimierz Dolny (Poland), 14-17 Jun 2004; Other Information: PBD: 2004; Related Information: In: Abstracts of 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, 257 pages.
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ARGON IONS; ATOMIC FORCE MICROSCOPY; CARBON IONS; DEPTH; ENERGY BEAM DEPOSITION; GRAPHITE; ION BEAMS; LAYERS; MECHANICAL PROPERTIES; MICROSTRUCTURE; MONOCRYSTALS; RAMAN SPECTRA; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SILICON CARBIDES; SPATIAL DISTRIBUTION; SPUTTERING; SURFACE COATING; THIN FILMS
OSTI ID:
20616891
Research Organizations:
Maria Curie-Sklodowska Univ., Lublin (Poland); Technical University, Lublin (Poland); Wroclaw University of Technology, Wroclaw (Poland); Association of Polish Electrical Engineers, Lublin (Poland)
Country of Origin:
Poland
Language:
English
Other Identifying Numbers:
Other: KBN grant no. 4 T08C 001 24; TRN: PL0500576060120
Availability:
Available at Institute of Electronic Materials Technology, ul. Wolczynska 133, 01-910 Warsaw, Poland
Submitting Site:
INIS
Size:
page(s) 138
Announcement Date:
Aug 21, 2005

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Citation Formats

Rajchel, B, Mitura, M, Rakowski, W, Rakowska, A, Weselucha-Birczynska, A, and Proniewicz, L M. Some aspects of creation of thin Si{sub x}C{sub y} gradient coating layers by dual beam IBAD method. Poland: N. p., 2004. Web.
Rajchel, B, Mitura, M, Rakowski, W, Rakowska, A, Weselucha-Birczynska, A, & Proniewicz, L M. Some aspects of creation of thin Si{sub x}C{sub y} gradient coating layers by dual beam IBAD method. Poland.
Rajchel, B, Mitura, M, Rakowski, W, Rakowska, A, Weselucha-Birczynska, A, and Proniewicz, L M. 2004. "Some aspects of creation of thin Si{sub x}C{sub y} gradient coating layers by dual beam IBAD method." Poland.
@misc{etde_20616891,
title = {Some aspects of creation of thin Si{sub x}C{sub y} gradient coating layers by dual beam IBAD method}
 author = {Rajchel, B, Mitura, M, Rakowski, W, Rakowska, A, Weselucha-Birczynska, A, and Proniewicz, L M}
 abstractNote = {No abstract prepared.}
 place = {Poland}
 year = {2004}
 month = {Jul}
 }