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ETDEWEB   /       /    XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation

XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation

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Abstract

No abstract prepared.
Authors:
Krzyzanowska, H; Zuk, J; [1]  Bubert, H; [2]  Rebohle, L; Skorupa, W [3] 
  1. Institute of Physics, Maria Curie-Sklodowska University, Lublin (Poland)
  2. Institute of Spectrochemistry and Applied Spectroscopy, Dortmund (Germany)
  3. Institute of Ion Beam Physics and Material Research, Forschungszentrum Rossendorf, Dresden (Germany)
Publication Date:
Jul 01, 2004
Product Type:
Conference
Resource Relation:
Conference: 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, Kazimierz Dolny (Poland), 14-17 Jun 2004; Other Information: PBD: 2004; Related Information: In: Abstracts of 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, 257 pages.
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANNEALING; CRYSTALS; GERMANIUM IONS; GERMANIUM OXIDES; ION IMPLANTATION; NANOSTRUCTURES; PHYSICAL RADIATION EFFECTS; SILICON; SILICON IONS; SILICON OXIDES; SUBSTRATES; TEMPERATURE DEPENDENCE; X-RAY PHOTOELECTRON SPECTROSCOPY
OSTI ID:
20616877
Research Organizations:
Maria Curie-Sklodowska Univ., Lublin (Poland); Technical University, Lublin (Poland); Wroclaw University of Technology, Wroclaw (Poland); Association of Polish Electrical Engineers, Lublin (Poland)
Country of Origin:
Poland
Language:
English
Other Identifying Numbers:
TRN: PL0500562060106
Availability:
Available at Institute of Electronic Materials Technology, ul. Wolczynska 133, 01-910 Warsaw, Poland
Submitting Site:
INIS
Size:
page(s) 123
Announcement Date:
Aug 21, 2005

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Citation Formats

Krzyzanowska, H, Zuk, J, Bubert, H, Rebohle, L, and Skorupa, W. XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation. Poland: N. p., 2004. Web.
Krzyzanowska, H, Zuk, J, Bubert, H, Rebohle, L, & Skorupa, W. XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation. Poland.
Krzyzanowska, H, Zuk, J, Bubert, H, Rebohle, L, and Skorupa, W. 2004. "XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation." Poland.
@misc{etde_20616877,
title = {XPS studies of Ge and Si nanostructures synthesized in SiO{sub 2} by ion implantation}
 author = {Krzyzanowska, H, Zuk, J, Bubert, H, Rebohle, L, and Skorupa, W}
 abstractNote = {No abstract prepared.}
 place = {Poland}
 year = {2004}
 month = {Jul}
 }