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ETDEWEB   /       /    Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application

Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application

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Abstract

No abstract prepared.
Authors:
Ryabchikov, A I; Rybchikov, I A; Stepanov, I B [1] 
  1. Nuclear Physics Institute at Tomsk Polytechnic University, Tomsk (Russian Federation)
Publication Date:
Jul 01, 2004
Product Type:
Conference
Resource Relation:
Conference: 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, Kazimierz Dolny (Poland), 14-17 Jun 2004; Other Information: PBD: 2004; Related Information: In: Abstracts of 5. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2004, 257 pages.
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ADHESION; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ION IMPLANTATION; METALS; PLASMA; PULSE TECHNIQUES; SEMICONDUCTOR MATERIALS; SURFACE COATING
OSTI ID:
20616813
Research Organizations:
Maria Curie-Sklodowska Univ., Lublin (Poland); Technical University, Lublin (Poland); Wroclaw University of Technology, Wroclaw (Poland); Association of Polish Electrical Engineers, Lublin (Poland)
Country of Origin:
Poland
Language:
English
Other Identifying Numbers:
TRN: PL0500498060042
Availability:
Available at Institute of Electronic Materials Technology, ul. Wolczynska 133, 01-910 Warsaw, Poland
Submitting Site:
INIS
Size:
page(s) 42
Announcement Date:
Aug 21, 2005

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Citation Formats

Ryabchikov, A I, Rybchikov, I A, and Stepanov, I B. Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application. Poland: N. p., 2004. Web.
Ryabchikov, A I, Rybchikov, I A, & Stepanov, I B. Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application. Poland.
Ryabchikov, A I, Rybchikov, I A, and Stepanov, I B. 2004. "Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application." Poland.
@misc{etde_20616813,
title = {Development of filtrated DC metal plasma ion implantation and coating deposition methods based on high frequency short-pulsed bias voltage application}
 author = {Ryabchikov, A I, Rybchikov, I A, and Stepanov, I B}
 abstractNote = {No abstract prepared.}
 place = {Poland}
 year = {2004}
 month = {Jul}
 }