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ETDEWEB   /       /    Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2

Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2

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Abstract

Research on the influence of ions CI and Cu on corrosion rate of AIMg2 nitride by using deposition plasma nitrogen method has been done. The aim of the experiment is to compare the corrosion rate of pure AIMg2 with the nitride AIMg2. The parameters condition of the nitrogen deposition were : 8.10{sup -}2 torr of pressure, 100 {sup o}C of temperature and 1 hour of deposition time and 100 watt RF power. The nitride AIMg2 metal was tested by corrosion method Potentiostat in mineral free water and salted CuCI solution. It was found that AIMg2 metal deposited had lower corrosion rate than AIMg2 metal without treatment of nitride thin film. The comparison was significant, especially at high concentration of CuCI at 10 ppm namely 0,624 mpy compared to 2,082 mpy. The homogeneity at I ppm concentration of CuCI was 0,71. Key words : plasma, thin film, corrosion.
Authors:
Yunanto,; Simbolon, Sahat; Atmono, Trimardji [1] 
  1. Center for Research and Development of Advanced Technology, National Nuclear Energy Agency, Serpong (Indonesia)
Publication Date:
Sep 01, 2000
Product Type:
Conference
Resource Relation:
Conference: Conference on the Role of Nuclear Science and Technology on Empowering National Potential, Prosiding Seminar Sains dan Teknologi Nuklir Dalam Pemberdayaan Potensi Nasional, Bandung (Indonesia), 11-12 Jul 2000; Other Information: 10 refs.; tabs.; 4 figs; PBD: Sep 2000; Related Information: In: Proceedings of the Seminar on Nuclear Science and Technology: The Role of Nuclear Science and Technology Emporing National Potential, by Sofyan, Rochestri; Rahardjo, Henky P.; Nurdin, Martias; Umar, Efrizon; Margono; Tanudjojo, Nurhayati; Kukuh, Ratnawati; Nurlaila, Z.; Faruq, Muhammad; Sambodo, Guntur Daru (eds.) [National Nuclear Energy Agency, Bandung (Indonesia)], 651 pages.
Subject:
36 MATERIALS SCIENCE; ALUMINIUM COMPOUNDS; CHLORINE; CLADDING; COPPER; CORROSION; DEPOSITION; NITRIDES; NITROGEN; PLASMA; THIN FILMS
OSTI ID:
20411151
Research Organizations:
Center for Research and Development of Nuclear Techniques, National Nuclear Energy Agency, Bandung (Indonesia)
Country of Origin:
Indonesia
Language:
Indonesian
Other Identifying Numbers:
Other: ISSN 1410-1769; TRN: ID0300210084884
Availability:
Available from Center for Development of Informatics and Computation Technology, National Nuclear Energy Agency, Puspiptek Area, Fax. 62-21-7560923, PO BOX 4274, Jakarta (ID)
Submitting Site:
INIS
Size:
page(s) 590-599
Announcement Date:
Dec 22, 2003

Conference:

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Citation Formats

Yunanto,, Simbolon, Sahat, and Atmono, Trimardji. Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2. Indonesia: N. p., 2000. Web.
Yunanto,, Simbolon, Sahat, & Atmono, Trimardji. Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2. Indonesia.
Yunanto,, Simbolon, Sahat, and Atmono, Trimardji. 2000. "Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2." Indonesia.
@misc{etde_20411151,
title = {Influence of CI and Cu ions on corrosion rate of AIMg2 nitride thin film; Pengaruh ion CI dan ion Cu terhadap pengaruh laju korosi pada lapisan tipis nitrida AIMg2}
 author = {Yunanto,, Simbolon, Sahat, and Atmono, Trimardji}
 abstractNote = {Research on the influence of ions CI and Cu on corrosion rate of AIMg2 nitride by using deposition plasma nitrogen method has been done. The aim of the experiment is to compare the corrosion rate of pure AIMg2 with the nitride AIMg2. The parameters condition of the nitrogen deposition were : 8.10{sup -}2 torr of pressure, 100 {sup o}C of temperature and 1 hour of deposition time and 100 watt RF power. The nitride AIMg2 metal was tested by corrosion method Potentiostat in mineral free water and salted CuCI solution. It was found that AIMg2 metal deposited had lower corrosion rate than AIMg2 metal without treatment of nitride thin film. The comparison was significant, especially at high concentration of CuCI at 10 ppm namely 0,624 mpy compared to 2,082 mpy. The homogeneity at I ppm concentration of CuCI was 0,71. Key words : plasma, thin film, corrosion.}
 place = {Indonesia}
 year = {2000}
 month = {Sep}
 }