Abstract
For the construction of a common base of key technologies in the domain of electronics and information with the influence propagating across a wide range of industries, research and development was conducted of technologies of ultrafine working process, technologies of ultimate measurement, analysis, and control, technologies of new functional electronic materials, etc. Studied in the field of electron beam lithography were high precision and large area imaging technology, highly accurate electron optics control system technology, and beam monitoring technology. Studied in the field of ultrashort wavelength electromagnetic wave patterning system technology were proximity ultrashort wavelength electromagnetic wave patterning system technology, reduced ultrashort wavelength electromagnetic wave patterning system technology, and ultrahigh precision new materials patterning technology. Also studied were technologies of super-advanced plasma measurement, analysis, and control, and technology of super-advanced cleaning. In the field of technologies of new functional elements and films, studies were conducted about technologies of highly sensitive GMR (giant magnetoresistive) film and head fabrication process for contact magnetic recording and technologies of a spin-valve head with submicron track width for contact magnetic recording. (NEDO)
Citation Formats
None.
Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo.
Japan: N. p.,
2002.
Web.
None.
Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo.
Japan.
None.
2002.
"Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo."
Japan.
@misc{etde_20303351,
title = {Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo}
author = {None}
abstractNote = {For the construction of a common base of key technologies in the domain of electronics and information with the influence propagating across a wide range of industries, research and development was conducted of technologies of ultrafine working process, technologies of ultimate measurement, analysis, and control, technologies of new functional electronic materials, etc. Studied in the field of electron beam lithography were high precision and large area imaging technology, highly accurate electron optics control system technology, and beam monitoring technology. Studied in the field of ultrashort wavelength electromagnetic wave patterning system technology were proximity ultrashort wavelength electromagnetic wave patterning system technology, reduced ultrashort wavelength electromagnetic wave patterning system technology, and ultrahigh precision new materials patterning technology. Also studied were technologies of super-advanced plasma measurement, analysis, and control, and technology of super-advanced cleaning. In the field of technologies of new functional elements and films, studies were conducted about technologies of highly sensitive GMR (giant magnetoresistive) film and head fabrication process for contact magnetic recording and technologies of a spin-valve head with submicron track width for contact magnetic recording. (NEDO)}
place = {Japan}
year = {2002}
month = {May}
}
title = {Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo}
author = {None}
abstractNote = {For the construction of a common base of key technologies in the domain of electronics and information with the influence propagating across a wide range of industries, research and development was conducted of technologies of ultrafine working process, technologies of ultimate measurement, analysis, and control, technologies of new functional electronic materials, etc. Studied in the field of electron beam lithography were high precision and large area imaging technology, highly accurate electron optics control system technology, and beam monitoring technology. Studied in the field of ultrashort wavelength electromagnetic wave patterning system technology were proximity ultrashort wavelength electromagnetic wave patterning system technology, reduced ultrashort wavelength electromagnetic wave patterning system technology, and ultrahigh precision new materials patterning technology. Also studied were technologies of super-advanced plasma measurement, analysis, and control, and technology of super-advanced cleaning. In the field of technologies of new functional elements and films, studies were conducted about technologies of highly sensitive GMR (giant magnetoresistive) film and head fabrication process for contact magnetic recording and technologies of a spin-valve head with submicron track width for contact magnetic recording. (NEDO)}
place = {Japan}
year = {2002}
month = {May}
}