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Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo

Abstract

For the construction of a common base of key technologies in the domain of electronics and information with the influence propagating across a wide range of industries, research and development was conducted of technologies of ultrafine working process, technologies of ultimate measurement, analysis, and control, technologies of new functional electronic materials, etc. Studied in the field of electron beam lithography were high precision and large area imaging technology, highly accurate electron optics control system technology, and beam monitoring technology. Studied in the field of ultrashort wavelength electromagnetic wave patterning system technology were proximity ultrashort wavelength electromagnetic wave patterning system technology, reduced ultrashort wavelength electromagnetic wave patterning system technology, and ultrahigh precision new materials patterning technology. Also studied were technologies of super-advanced plasma measurement, analysis, and control, and technology of super-advanced cleaning. In the field of technologies of new functional elements and films, studies were conducted about technologies of highly sensitive GMR (giant magnetoresistive) film and head fabrication process for contact magnetic recording and technologies of a spin-valve head with submicron track width for contact magnetic recording. (NEDO)
Authors:
"NONE"
Publication Date:
May 01, 2002
Product Type:
Technical Report
Report Number:
JP-NEDO-010020380
Resource Relation:
Other Information: PBD: May 2002
Subject:
42 ENGINEERING; RESEARCH PROGRAMS; ELECTRONIC EQUIPMENT; ELECTRONIC CIRCUITS; INFORMATION SYSTEMS; MICROELECTRONICS; MICROPROCESSORS; MATERIALS WORKING; ACCURACY; CONTROL SYSTEMS; ELECTROMAGNETIC RADIATION; MEASURING INSTRUMENTS; SENSITIVITY; RECORDING SYSTEMS
OSTI ID:
20303351
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
TRN: JN0240650
Availability:
Available to ETDE participating countries only(see www.etde.org); commercial reproduction prohibited; OSTI as DE20303351
Submitting Site:
NEDO
Size:
1500 pages
Announcement Date:

Citation Formats

Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo. Japan: N. p., 2002. Web.
Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo. Japan.
2002. "Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo." Japan.
@misc{etde_20303351,
title = {Fiscal 2000 research achievement report. Super-advanced electronics technologies development promotion project; 2000 nendo kenkyu seika hokokusho. Cho sentan gijutsu kaihatsu sokushin jigyo}
abstractNote = {For the construction of a common base of key technologies in the domain of electronics and information with the influence propagating across a wide range of industries, research and development was conducted of technologies of ultrafine working process, technologies of ultimate measurement, analysis, and control, technologies of new functional electronic materials, etc. Studied in the field of electron beam lithography were high precision and large area imaging technology, highly accurate electron optics control system technology, and beam monitoring technology. Studied in the field of ultrashort wavelength electromagnetic wave patterning system technology were proximity ultrashort wavelength electromagnetic wave patterning system technology, reduced ultrashort wavelength electromagnetic wave patterning system technology, and ultrahigh precision new materials patterning technology. Also studied were technologies of super-advanced plasma measurement, analysis, and control, and technology of super-advanced cleaning. In the field of technologies of new functional elements and films, studies were conducted about technologies of highly sensitive GMR (giant magnetoresistive) film and head fabrication process for contact magnetic recording and technologies of a spin-valve head with submicron track width for contact magnetic recording. (NEDO)}
place = {Japan}
year = {2002}
month = {May}
}