Abstract
The efforts aim to develop a CVD (chemical vapor deposition) mechanism cleaning gas with less environmental impact such as global warming and a CVD process using the same. The candidate gas synthesizing study for the development of such a gas continues from the preceding fiscal year. In addition, various candidate gases and tentatively synthesized gases are evaluated for their cleaning performance using a simplified experimental system. As the result, patent applications were filed for three novel alternative gases low in environmental impact and high in cleaning performance. In the research and development of CVD processes, a verification test process is developed for the evaluation of alternative gases at the real system level using a large CVD evaluation system. Studies are also made in which some existing gases are utilized to improve on CVD cleaning efficiency and to reduce greenhouse gas emissions. In relation to the process, one domestic patent application is made, and three essays are presented at an international conference on electrochemistry in the United States. (NEDO)
Citation Formats
None.
Fiscal 2000 achievement report. Research and development of semiconductor CVD chamber cleaning systems for electronic device manufacturing using new alternative gas instead of SF6, PFCs, and other gases; 2000 nendo sokkoteki kakushinteki energy kankyo gijutsu kaihatsu seika hokokusho. SF6 tou ni daitaisuru gasu wo riyo shita denshi debaisu seizo cleaning system no kenkyu kaihatsu.
Japan: N. p.,
2001.
Web.
None.
Fiscal 2000 achievement report. Research and development of semiconductor CVD chamber cleaning systems for electronic device manufacturing using new alternative gas instead of SF6, PFCs, and other gases; 2000 nendo sokkoteki kakushinteki energy kankyo gijutsu kaihatsu seika hokokusho. SF6 tou ni daitaisuru gasu wo riyo shita denshi debaisu seizo cleaning system no kenkyu kaihatsu.
Japan.
None.
2001.
"Fiscal 2000 achievement report. Research and development of semiconductor CVD chamber cleaning systems for electronic device manufacturing using new alternative gas instead of SF6, PFCs, and other gases; 2000 nendo sokkoteki kakushinteki energy kankyo gijutsu kaihatsu seika hokokusho. SF6 tou ni daitaisuru gasu wo riyo shita denshi debaisu seizo cleaning system no kenkyu kaihatsu."
Japan.
@misc{etde_20291723,
title = {Fiscal 2000 achievement report. Research and development of semiconductor CVD chamber cleaning systems for electronic device manufacturing using new alternative gas instead of SF6, PFCs, and other gases; 2000 nendo sokkoteki kakushinteki energy kankyo gijutsu kaihatsu seika hokokusho. SF6 tou ni daitaisuru gasu wo riyo shita denshi debaisu seizo cleaning system no kenkyu kaihatsu}
author = {None}
abstractNote = {The efforts aim to develop a CVD (chemical vapor deposition) mechanism cleaning gas with less environmental impact such as global warming and a CVD process using the same. The candidate gas synthesizing study for the development of such a gas continues from the preceding fiscal year. In addition, various candidate gases and tentatively synthesized gases are evaluated for their cleaning performance using a simplified experimental system. As the result, patent applications were filed for three novel alternative gases low in environmental impact and high in cleaning performance. In the research and development of CVD processes, a verification test process is developed for the evaluation of alternative gases at the real system level using a large CVD evaluation system. Studies are also made in which some existing gases are utilized to improve on CVD cleaning efficiency and to reduce greenhouse gas emissions. In relation to the process, one domestic patent application is made, and three essays are presented at an international conference on electrochemistry in the United States. (NEDO)}
place = {Japan}
year = {2001}
month = {Mar}
}
title = {Fiscal 2000 achievement report. Research and development of semiconductor CVD chamber cleaning systems for electronic device manufacturing using new alternative gas instead of SF6, PFCs, and other gases; 2000 nendo sokkoteki kakushinteki energy kankyo gijutsu kaihatsu seika hokokusho. SF6 tou ni daitaisuru gasu wo riyo shita denshi debaisu seizo cleaning system no kenkyu kaihatsu}
author = {None}
abstractNote = {The efforts aim to develop a CVD (chemical vapor deposition) mechanism cleaning gas with less environmental impact such as global warming and a CVD process using the same. The candidate gas synthesizing study for the development of such a gas continues from the preceding fiscal year. In addition, various candidate gases and tentatively synthesized gases are evaluated for their cleaning performance using a simplified experimental system. As the result, patent applications were filed for three novel alternative gases low in environmental impact and high in cleaning performance. In the research and development of CVD processes, a verification test process is developed for the evaluation of alternative gases at the real system level using a large CVD evaluation system. Studies are also made in which some existing gases are utilized to improve on CVD cleaning efficiency and to reduce greenhouse gas emissions. In relation to the process, one domestic patent application is made, and three essays are presented at an international conference on electrochemistry in the United States. (NEDO)}
place = {Japan}
year = {2001}
month = {Mar}
}