Abstract
A workshop was held in order to realize the high-level information society, and bring about the common recognition on the assignments in the directionality to go in the next five years and on the problems to be worked on with emphasis in semiconductor technologies to form the foundation thereof, standing on the viewpoint of about ten years ahead. The matters discussed in the major semiconductor technology field included promotion of development of functions and technologies sought in the next generation system LSI, CAD system technologies, assurance of design engineers, development of new devices corresponding to electric power saving requirement, promotion of high integration elementary technologies, innovation in memory elementary technologies and structuring of new devices, new materials and processes for SoC, establishment of the membrane technology to insulate low-k layers, necessity of coordination from the basics to the applied fields, development of lithography and measuring technologies of sub-100 nm, and post photo-lithography technologies, promotion of micro measurement and macro measurement technologies, requirements in high-profit type semiconductor production technologies, and structuring of production factories with high QTAT and flexibility. (NEDO)
Citation Formats
None.
Report on surveys in fiscal 2000 on the workshop on semiconductor technology for 21st century; 2000 nendo 21 seiki wo hiraku handotai gijutsu workshop chosa hokokusho.
Japan: N. p.,
2000.
Web.
None.
Report on surveys in fiscal 2000 on the workshop on semiconductor technology for 21st century; 2000 nendo 21 seiki wo hiraku handotai gijutsu workshop chosa hokokusho.
Japan.
None.
2000.
"Report on surveys in fiscal 2000 on the workshop on semiconductor technology for 21st century; 2000 nendo 21 seiki wo hiraku handotai gijutsu workshop chosa hokokusho."
Japan.
@misc{etde_20232950,
title = {Report on surveys in fiscal 2000 on the workshop on semiconductor technology for 21st century; 2000 nendo 21 seiki wo hiraku handotai gijutsu workshop chosa hokokusho}
author = {None}
abstractNote = {A workshop was held in order to realize the high-level information society, and bring about the common recognition on the assignments in the directionality to go in the next five years and on the problems to be worked on with emphasis in semiconductor technologies to form the foundation thereof, standing on the viewpoint of about ten years ahead. The matters discussed in the major semiconductor technology field included promotion of development of functions and technologies sought in the next generation system LSI, CAD system technologies, assurance of design engineers, development of new devices corresponding to electric power saving requirement, promotion of high integration elementary technologies, innovation in memory elementary technologies and structuring of new devices, new materials and processes for SoC, establishment of the membrane technology to insulate low-k layers, necessity of coordination from the basics to the applied fields, development of lithography and measuring technologies of sub-100 nm, and post photo-lithography technologies, promotion of micro measurement and macro measurement technologies, requirements in high-profit type semiconductor production technologies, and structuring of production factories with high QTAT and flexibility. (NEDO)}
place = {Japan}
year = {2000}
month = {Aug}
}
title = {Report on surveys in fiscal 2000 on the workshop on semiconductor technology for 21st century; 2000 nendo 21 seiki wo hiraku handotai gijutsu workshop chosa hokokusho}
author = {None}
abstractNote = {A workshop was held in order to realize the high-level information society, and bring about the common recognition on the assignments in the directionality to go in the next five years and on the problems to be worked on with emphasis in semiconductor technologies to form the foundation thereof, standing on the viewpoint of about ten years ahead. The matters discussed in the major semiconductor technology field included promotion of development of functions and technologies sought in the next generation system LSI, CAD system technologies, assurance of design engineers, development of new devices corresponding to electric power saving requirement, promotion of high integration elementary technologies, innovation in memory elementary technologies and structuring of new devices, new materials and processes for SoC, establishment of the membrane technology to insulate low-k layers, necessity of coordination from the basics to the applied fields, development of lithography and measuring technologies of sub-100 nm, and post photo-lithography technologies, promotion of micro measurement and macro measurement technologies, requirements in high-profit type semiconductor production technologies, and structuring of production factories with high QTAT and flexibility. (NEDO)}
place = {Japan}
year = {2000}
month = {Aug}
}