You need JavaScript to view this

Fiscal 1998 research achievement report. Project for promoting development of super-advanced electronic technology; 1998 nendo chosentan denshi gijutsu kaihatsu sokushin jigyo seika hokokusho

Abstract

For the purpose of establishing super-advanced technologies two generations ahead in the field of electronics and information, research and development was carried out involving ultrafine machining process technology, technologies of ultimate measuring, analysis, and control, and technologies of electronic materials equipped with novel functions. In the study of writing systems in which writing is performed directly by an electron beam, writing technologies using electron beams under single-column and multi-column systems were taken up. In the study of ultrashort wavelength electromagnetic wave patterning systems, studies were made about equimultiple ultrashort wavelength and reduced ultrashort wavelength electromagnetic wave patterning. In the study of ultrahigh precision shielding systems, studies involved high precision in situ measurement and control of writing distortion, and ultrahigh precision and high current density electronic optical technologies. Also carried out were research and development of technologies of super-advanced plasma measurement, analysis, and control, technology of cleaning by ultrafine particle control, technology of ultrahigh sensitivity medium, and technologies of new functional elements and film fabrication. In the overall research and survey, surveys were conducted of the trends of development of technology of semiconductor related lithography. (NEDO)
Authors:
"NONE"
Publication Date:
May 01, 2000
Product Type:
Technical Report
Report Number:
JP-NEDO-010015295
Resource Relation:
Other Information: PBD: May 2000
Subject:
42 ENGINEERING; ELECTRONIC EQUIPMENT; INFORMATION SYSTEMS; MATERIALS WORKING; MICROSTRUCTURE; ELECTRON BEAMS; ACCURACY; MEASURING INSTRUMENTS; CURRENT DENSITY; CONTROL SYSTEMS; SEMICONDUCTOR DEVICES
OSTI ID:
20175341
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
TRN: JN0140341
Availability:
Available to ETDE participating countries only(see www.etde.org); commercial reproduction prohibited; OSTI as DE20175341
Submitting Site:
NEDO
Size:
977 pages
Announcement Date:

Citation Formats

Fiscal 1998 research achievement report. Project for promoting development of super-advanced electronic technology; 1998 nendo chosentan denshi gijutsu kaihatsu sokushin jigyo seika hokokusho. Japan: N. p., 2000. Web.
Fiscal 1998 research achievement report. Project for promoting development of super-advanced electronic technology; 1998 nendo chosentan denshi gijutsu kaihatsu sokushin jigyo seika hokokusho. Japan.
2000. "Fiscal 1998 research achievement report. Project for promoting development of super-advanced electronic technology; 1998 nendo chosentan denshi gijutsu kaihatsu sokushin jigyo seika hokokusho." Japan.
@misc{etde_20175341,
title = {Fiscal 1998 research achievement report. Project for promoting development of super-advanced electronic technology; 1998 nendo chosentan denshi gijutsu kaihatsu sokushin jigyo seika hokokusho}
abstractNote = {For the purpose of establishing super-advanced technologies two generations ahead in the field of electronics and information, research and development was carried out involving ultrafine machining process technology, technologies of ultimate measuring, analysis, and control, and technologies of electronic materials equipped with novel functions. In the study of writing systems in which writing is performed directly by an electron beam, writing technologies using electron beams under single-column and multi-column systems were taken up. In the study of ultrashort wavelength electromagnetic wave patterning systems, studies were made about equimultiple ultrashort wavelength and reduced ultrashort wavelength electromagnetic wave patterning. In the study of ultrahigh precision shielding systems, studies involved high precision in situ measurement and control of writing distortion, and ultrahigh precision and high current density electronic optical technologies. Also carried out were research and development of technologies of super-advanced plasma measurement, analysis, and control, technology of cleaning by ultrafine particle control, technology of ultrahigh sensitivity medium, and technologies of new functional elements and film fabrication. In the overall research and survey, surveys were conducted of the trends of development of technology of semiconductor related lithography. (NEDO)}
place = {Japan}
year = {2000}
month = {May}
}