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FY 1991 Research and development project for large-scale industrial technologies. Report on results of R and D of superhigh technological machining systems; 1991 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Chosentan kako system no kenkyu kaihatsu

Abstract

Described herein are the FY 1991 results of the R and D project aimed at establishment of superprecision machining technologies for developing machining technologies and nano-technologies aided by excited beams. The researches on the superprecision machining technologies involve design and development, on a trial basis, of the totally static pressure type positioning device, for which automatically controlling drawing is adopted to improve its rigidity. The researches on the surface modification technologies aided by ion beams involve scanning the ion beams onto the metallic plate to be provided around the glass substrate. The results indicate that the secondary electrons generated can be used to control charge-up. In addition, part of a 30cm square glass substrate is modified by implantation of the spot type ions of high current density, and the modified portion is used to produce a thin-film silicon transistor. The researches on superhigh-technological machining standard measurement involve improvement of precision of the system aided by a dye laser, which attains a precision of 0 to 30nm in a 0.1m measurement range. (NEDO)
Authors:
"NONE"
Publication Date:
Mar 01, 1992
Product Type:
Technical Report
Report Number:
JP-NEDO-010014934
Resource Relation:
Other Information: PBD: Mar 1992
Subject:
36 MATERIALS SCIENCE; MATERIALS WORKING; ION BEAMS; ACCURACY; PNEUMATIC CONTROLLERS; POSITIONING; SURFACE TREATMENTS; CURRENT DENSITY; SILICON; THIN FILMS; TRANSISTORS
OSTI ID:
20163350
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
TRN: JN0042285
Availability:
Available to ETDE participating countries only(see www.etde.org); commercial reproduction prohibited; OSTI as DE20163350
Submitting Site:
NEDO
Size:
[170] pages
Announcement Date:

Citation Formats

FY 1991 Research and development project for large-scale industrial technologies. Report on results of R and D of superhigh technological machining systems; 1991 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Chosentan kako system no kenkyu kaihatsu. Japan: N. p., 1992. Web.
FY 1991 Research and development project for large-scale industrial technologies. Report on results of R and D of superhigh technological machining systems; 1991 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Chosentan kako system no kenkyu kaihatsu. Japan.
1992. "FY 1991 Research and development project for large-scale industrial technologies. Report on results of R and D of superhigh technological machining systems; 1991 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Chosentan kako system no kenkyu kaihatsu." Japan.
@misc{etde_20163350,
title = {FY 1991 Research and development project for large-scale industrial technologies. Report on results of R and D of superhigh technological machining systems; 1991 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Chosentan kako system no kenkyu kaihatsu}
abstractNote = {Described herein are the FY 1991 results of the R and D project aimed at establishment of superprecision machining technologies for developing machining technologies and nano-technologies aided by excited beams. The researches on the superprecision machining technologies involve design and development, on a trial basis, of the totally static pressure type positioning device, for which automatically controlling drawing is adopted to improve its rigidity. The researches on the surface modification technologies aided by ion beams involve scanning the ion beams onto the metallic plate to be provided around the glass substrate. The results indicate that the secondary electrons generated can be used to control charge-up. In addition, part of a 30cm square glass substrate is modified by implantation of the spot type ions of high current density, and the modified portion is used to produce a thin-film silicon transistor. The researches on superhigh-technological machining standard measurement involve improvement of precision of the system aided by a dye laser, which attains a precision of 0 to 30nm in a 0.1m measurement range. (NEDO)}
place = {Japan}
year = {1992}
month = {Mar}
}