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Research and development project in fiscal 1990 for large industrial technologies. Achievement report on research and development of ultra-advanced processing systems (Development of high-level processing devices for electric power generation facility members); 1990 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Hatsuden shisetsuyo buzai kodo kako sochi kaihatsu

Abstract

Research and development has been performed with an objective to establish the processing technology using excitation beam required for the advanced technology industries, and the ultra-precision machining technology to realize the nano-technology. This paper summarizes the achievements in fiscal 1990. In the research on the large output and long life technology for excimer laser, an average output of 500 W or more was demonstrated achieving the intermediate target by developing and improving the technologies for low electric power gas circulation, high efficiency discharge and excitation, and large output oscillation control. In the research on intensity resistant optical element technology, a prototype device was fabricated to create and process axially symmetrical aspherical shapes, whereas SiC aspherical shape creation and processing were demonstrated at the shape accuracy of three microns or better, and surface roughness of 20 nanometers or less, having achieved the intermediate target. Regarding the large current ion beam, a demonstration device was completed based on improvements and test results on the sheet plasma generator. In the research and development of the high-level processing technology, low-temperature forming technology was developed for oxide ceramic thin films by using the excimer laser abrasion method. (NEDO)
Publication Date:
Mar 01, 1991
Product Type:
Technical Report
Report Number:
JP-NEDO-010014928
Resource Relation:
Other Information: PBD: Mar 1991
Subject:
36 MATERIALS SCIENCE; MATERIALS WORKING; MACHINE PARTS; ION BEAMS; ACCURACY; NEODYMIUM LASERS; LIFETIME; SURFACE PROPERTIES; SILICON CARBIDES; CERAMICS; ABRASION
OSTI ID:
20163344
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
TRN: JN0042279
Availability:
Available to ETDE participating countries only(see www.etde.org); commercial reproduction prohibited; OSTI as DE20163344
Submitting Site:
NEDO
Size:
[850] pages
Announcement Date:
May 29, 2002

Citation Formats

None. Research and development project in fiscal 1990 for large industrial technologies. Achievement report on research and development of ultra-advanced processing systems (Development of high-level processing devices for electric power generation facility members); 1990 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Hatsuden shisetsuyo buzai kodo kako sochi kaihatsu. Japan: N. p., 1991. Web.
None. Research and development project in fiscal 1990 for large industrial technologies. Achievement report on research and development of ultra-advanced processing systems (Development of high-level processing devices for electric power generation facility members); 1990 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Hatsuden shisetsuyo buzai kodo kako sochi kaihatsu. Japan.
None. 1991. "Research and development project in fiscal 1990 for large industrial technologies. Achievement report on research and development of ultra-advanced processing systems (Development of high-level processing devices for electric power generation facility members); 1990 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Hatsuden shisetsuyo buzai kodo kako sochi kaihatsu." Japan.
@misc{etde_20163344,
title = {Research and development project in fiscal 1990 for large industrial technologies. Achievement report on research and development of ultra-advanced processing systems (Development of high-level processing devices for electric power generation facility members); 1990 nendo chosentan kako system no kenkyu kaihatsu seika hokokusho. Hatsuden shisetsuyo buzai kodo kako sochi kaihatsu}
author = {None}
abstractNote = {Research and development has been performed with an objective to establish the processing technology using excitation beam required for the advanced technology industries, and the ultra-precision machining technology to realize the nano-technology. This paper summarizes the achievements in fiscal 1990. In the research on the large output and long life technology for excimer laser, an average output of 500 W or more was demonstrated achieving the intermediate target by developing and improving the technologies for low electric power gas circulation, high efficiency discharge and excitation, and large output oscillation control. In the research on intensity resistant optical element technology, a prototype device was fabricated to create and process axially symmetrical aspherical shapes, whereas SiC aspherical shape creation and processing were demonstrated at the shape accuracy of three microns or better, and surface roughness of 20 nanometers or less, having achieved the intermediate target. Regarding the large current ion beam, a demonstration device was completed based on improvements and test results on the sheet plasma generator. In the research and development of the high-level processing technology, low-temperature forming technology was developed for oxide ceramic thin films by using the excimer laser abrasion method. (NEDO)}
place = {Japan}
year = {1991}
month = {Mar}
}