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Fiscal 1974 Sunshine Project result report. R and D on photovoltaic power generation system (R and D on Si ribbon crystal horizontal pulling method); 1974 nendo taiyoko hatsuden system seika hokokusho. Silicon yokohiki ribbon kessho no kenkyu kaihatsu

Abstract

The ribbon crystal horizontal pulling process first supplies Si melt from a continuous Si material supply equipment to a pulling bath which is formed by a quartz crucible and heater. Supplied melt is heated by the pulling bath heater to keep its molten condition. The pulling bath is piled up to the top rim of the quartz crucible by supplied melt, forming the liquid surface of the pulling bath. A plane crystal seed is contacted with melt nearly horizontally. A crystal growth layer is formed at the solid-liquid interface of the contact part of the seed by controlling a heat control equipment and bath heating power. Non-dendrite growth is better in crystal quality than the others. Among non-dendrite growth methods, a horizontal pulling method is more excellent in fast pulling of wider ribbon crystals than a vertical one. Among horizontal pulling methods, Toyo Silicon Co.' method discharges heat into gas phase by using free surface including the vicinity of the seed as cooling surface, while Bleil method uses a solid heat sink for heat release, resulting in slower crystal growth. (NEDO)
Authors:
"NONE"
Publication Date:
May 01, 1975
Product Type:
Technical Report
Report Number:
JP-NEDO-010017860
Resource Relation:
Other Information: PBD: May 1975
Subject:
14 SOLAR ENERGY; SUNSHINE PROJECT; PHOTOVOLTAIC POWER PLANTS; SOLAR CELLS; RIBBON-TO-RIBBON METHOD; RIBBON-TO-SHEET METHOD; QUARTZ; CRUCIBLES; DENDRITES; DENDRITIC WEB GROWTH METHOD; HEAT SINKS; CRYSTAL GROWTH
OSTI ID:
20093228
Research Organizations:
New Energy and Industrial Technology Development Organization, Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
TRN: JN0040456
Availability:
Available to ETDE participating countries only(see www.etde.org); commercial reproduction prohibited; OSTI as DE20093228
Submitting Site:
NEDO
Size:
115 pages
Announcement Date:

Citation Formats

Fiscal 1974 Sunshine Project result report. R and D on photovoltaic power generation system (R and D on Si ribbon crystal horizontal pulling method); 1974 nendo taiyoko hatsuden system seika hokokusho. Silicon yokohiki ribbon kessho no kenkyu kaihatsu. Japan: N. p., 1975. Web.
Fiscal 1974 Sunshine Project result report. R and D on photovoltaic power generation system (R and D on Si ribbon crystal horizontal pulling method); 1974 nendo taiyoko hatsuden system seika hokokusho. Silicon yokohiki ribbon kessho no kenkyu kaihatsu. Japan.
1975. "Fiscal 1974 Sunshine Project result report. R and D on photovoltaic power generation system (R and D on Si ribbon crystal horizontal pulling method); 1974 nendo taiyoko hatsuden system seika hokokusho. Silicon yokohiki ribbon kessho no kenkyu kaihatsu." Japan.
@misc{etde_20093228,
title = {Fiscal 1974 Sunshine Project result report. R and D on photovoltaic power generation system (R and D on Si ribbon crystal horizontal pulling method); 1974 nendo taiyoko hatsuden system seika hokokusho. Silicon yokohiki ribbon kessho no kenkyu kaihatsu}
abstractNote = {The ribbon crystal horizontal pulling process first supplies Si melt from a continuous Si material supply equipment to a pulling bath which is formed by a quartz crucible and heater. Supplied melt is heated by the pulling bath heater to keep its molten condition. The pulling bath is piled up to the top rim of the quartz crucible by supplied melt, forming the liquid surface of the pulling bath. A plane crystal seed is contacted with melt nearly horizontally. A crystal growth layer is formed at the solid-liquid interface of the contact part of the seed by controlling a heat control equipment and bath heating power. Non-dendrite growth is better in crystal quality than the others. Among non-dendrite growth methods, a horizontal pulling method is more excellent in fast pulling of wider ribbon crystals than a vertical one. Among horizontal pulling methods, Toyo Silicon Co.' method discharges heat into gas phase by using free surface including the vicinity of the seed as cooling surface, while Bleil method uses a solid heat sink for heat release, resulting in slower crystal growth. (NEDO)}
place = {Japan}
year = {1975}
month = {May}
}