Abstract
Improvement of the corrosion resistance of fuel claddings in Pressurized Water Reactors (PWR) has received increasing interest over last decade. Moreover, few data concerning dielectric properties, chemical composition and structure of oxide films are nowadays available. The purpose of this paper is to analyze the chemical and physical features of oxide films formed on Zircaloy 4 in conditions similar to PWR exposure and to connect modifications of these features to the change in the kinetic of the oxidation process.
Citation Formats
Bataillon, C, and Brunet, S.
Impedance study of oxide films formed on zircaloy 4 in high temperature pressurized water.
France: N. p.,
1991.
Web.
Bataillon, C, & Brunet, S.
Impedance study of oxide films formed on zircaloy 4 in high temperature pressurized water.
France.
Bataillon, C, and Brunet, S.
1991.
"Impedance study of oxide films formed on zircaloy 4 in high temperature pressurized water."
France.
@misc{etde_10154596,
title = {Impedance study of oxide films formed on zircaloy 4 in high temperature pressurized water}
author = {Bataillon, C, and Brunet, S}
abstractNote = {Improvement of the corrosion resistance of fuel claddings in Pressurized Water Reactors (PWR) has received increasing interest over last decade. Moreover, few data concerning dielectric properties, chemical composition and structure of oxide films are nowadays available. The purpose of this paper is to analyze the chemical and physical features of oxide films formed on Zircaloy 4 in conditions similar to PWR exposure and to connect modifications of these features to the change in the kinetic of the oxidation process.}
place = {France}
year = {1991}
month = {Dec}
}
title = {Impedance study of oxide films formed on zircaloy 4 in high temperature pressurized water}
author = {Bataillon, C, and Brunet, S}
abstractNote = {Improvement of the corrosion resistance of fuel claddings in Pressurized Water Reactors (PWR) has received increasing interest over last decade. Moreover, few data concerning dielectric properties, chemical composition and structure of oxide films are nowadays available. The purpose of this paper is to analyze the chemical and physical features of oxide films formed on Zircaloy 4 in conditions similar to PWR exposure and to connect modifications of these features to the change in the kinetic of the oxidation process.}
place = {France}
year = {1991}
month = {Dec}
}