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Structure-phase state of thick amorphous and microcrystalline chromium-carbon films deposited by ion-plasma sputtering.

Abstract

The structure-phase state of Cr:C films prepared by reactive evaporation with arc discharge was studied. The nonequilibrium structure and phase diagram of the system in the carbon concentration range 0...35 at.% and at temperatures 300...1100 K was obtained. The temperature-concentration diagram of Cr:C films microhardness is presented. (author). 5 refs., 5 figs.
Publication Date:
Dec 31, 1993
Product Type:
Technical Report
Report Number:
KFTI-93-35
Reference Number:
SCA: 360602; PA: AIX-25:036058; EDB-94:082097; ERA-19:019101; NTS-94:022070; SN: 94001206901
Resource Relation:
Other Information: PBD: 1993
Subject:
36 MATERIALS SCIENCE; CARBON COMPOUNDS; COATINGS; MICROSTRUCTURE; PHASE STUDIES; CHROMIUM COMPOUNDS; BEAM-PLASMA SYSTEMS; CRYSTAL-PHASE TRANSFORMATIONS; DIFFRACTION; FILMS; MICROHARDNESS; PHASE DIAGRAMS; SOLID SOLUTIONS; SPUTTERING; 360602; STRUCTURE AND PHASE STUDIES
OSTI ID:
10152631
Research Organizations:
AN Ukrainskoj SSR, Kharkov (Ukraine). Fiziko-Tekhnicheskij Inst.
Country of Origin:
Ukraine
Language:
English
Other Identifying Numbers:
Other: ON: DE94624236; TRN: UA9400330036058
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
INIS
Size:
7 p.
Announcement Date:
Jul 05, 2005

Citation Formats

Bakaj, A S, Sleptsov, S N, Marchenko, I G, and Sleptsov, A N. Structure-phase state of thick amorphous and microcrystalline chromium-carbon films deposited by ion-plasma sputtering.. Ukraine: N. p., 1993. Web.
Bakaj, A S, Sleptsov, S N, Marchenko, I G, & Sleptsov, A N. Structure-phase state of thick amorphous and microcrystalline chromium-carbon films deposited by ion-plasma sputtering.. Ukraine.
Bakaj, A S, Sleptsov, S N, Marchenko, I G, and Sleptsov, A N. 1993. "Structure-phase state of thick amorphous and microcrystalline chromium-carbon films deposited by ion-plasma sputtering." Ukraine.
@misc{etde_10152631,
title = {Structure-phase state of thick amorphous and microcrystalline chromium-carbon films deposited by ion-plasma sputtering.}
author = {Bakaj, A S, Sleptsov, S N, Marchenko, I G, and Sleptsov, A N}
abstractNote = {The structure-phase state of Cr:C films prepared by reactive evaporation with arc discharge was studied. The nonequilibrium structure and phase diagram of the system in the carbon concentration range 0...35 at.% and at temperatures 300...1100 K was obtained. The temperature-concentration diagram of Cr:C films microhardness is presented. (author). 5 refs., 5 figs.}
place = {Ukraine}
year = {1993}
month = {Dec}
}