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Annealing study of main electron irradiation-induced defects (H{sub 4} and H{sub 5}) in P-In P using DLTS technique

Abstract

Thermal annealing of the two hole traps H{sub 4} and H{sub 5} in room-temperature electron-irradiated In P Schottky diodes was investigated. Electron-irradiation energy ranging between 0.15 and 1.5 MeV with doses ranging between 5 x 10{sup 14} and 10{sup 16} e/cm{sup 2}. DLTS technique with double-phase detector was used in this study. Contrary to what is generally admitted, we found that H{sub 5} anneals out at about 150 C{sup o} with an activation energy of 1 eV. We have shown that H{sub 4} is a complex defect having two components that we could resolve. While the first one, having lower emission cross section and higher capture cross section with {Delta}E = 0.37 eV anneals out at about 110 C{sup o}. The other component, with {Delta}E = 0.50 eV is thermally stable even above 170 C{sup o}. (author). 13 refs., 17 figs., 2 tabs.
Authors:
M assarani, B; Awad, F; Kaaka, M [1] 
  1. Atomic Energy Commission, Damascus (Syrian Arab Republic). Dept. of Physics
Publication Date:
Dec 01, 1992
Product Type:
Technical Report
Report Number:
AECS-PH/FRSR-62
Reference Number:
SCA: 665300; PA: AIX-24:037275; SN: 93000977647
Resource Relation:
Other Information: PBD: Dec 1992
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; INDIUM PHOSPHIDES; CRYSTAL DEFECTS; SPECTROSCOPY; ANNEALING; ELECTRONS; IRRADIATION; KEV RANGE 100-1000; MEV RANGE 01-10; PHYSICAL RADIATION EFFECTS; 665300; INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
OSTI ID:
10144904
Research Organizations:
Atomic Energy Commission, Damascus (Syrian Arab Republic)
Country of Origin:
Syrian Arab Republic
Language:
Arabic
Other Identifying Numbers:
Other: ON: DE93623204; TRN: SY9300228037275
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
INIS
Size:
[35] p.
Announcement Date:
Jul 05, 2005

Citation Formats

M assarani, B, Awad, F, and Kaaka, M. Annealing study of main electron irradiation-induced defects (H{sub 4} and H{sub 5}) in P-In P using DLTS technique. Syrian Arab Republic: N. p., 1992. Web.
M assarani, B, Awad, F, & Kaaka, M. Annealing study of main electron irradiation-induced defects (H{sub 4} and H{sub 5}) in P-In P using DLTS technique. Syrian Arab Republic.
M assarani, B, Awad, F, and Kaaka, M. 1992. "Annealing study of main electron irradiation-induced defects (H{sub 4} and H{sub 5}) in P-In P using DLTS technique." Syrian Arab Republic.
@misc{etde_10144904,
title = {Annealing study of main electron irradiation-induced defects (H{sub 4} and H{sub 5}) in P-In P using DLTS technique}
author = {M assarani, B, Awad, F, and Kaaka, M}
abstractNote = {Thermal annealing of the two hole traps H{sub 4} and H{sub 5} in room-temperature electron-irradiated In P Schottky diodes was investigated. Electron-irradiation energy ranging between 0.15 and 1.5 MeV with doses ranging between 5 x 10{sup 14} and 10{sup 16} e/cm{sup 2}. DLTS technique with double-phase detector was used in this study. Contrary to what is generally admitted, we found that H{sub 5} anneals out at about 150 C{sup o} with an activation energy of 1 eV. We have shown that H{sub 4} is a complex defect having two components that we could resolve. While the first one, having lower emission cross section and higher capture cross section with {Delta}E = 0.37 eV anneals out at about 110 C{sup o}. The other component, with {Delta}E = 0.50 eV is thermally stable even above 170 C{sup o}. (author). 13 refs., 17 figs., 2 tabs.}
place = {Syrian Arab Republic}
year = {1992}
month = {Dec}
}