Abstract
Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon. (author) 3 figs., 19 refs.
Howling, A A;
Dorier, J L;
Hollenstein, C
[1]
- Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP)
Citation Formats
Howling, A A, Dorier, J L, and Hollenstein, C.
Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments.
Switzerland: N. p.,
1992.
Web.
Howling, A A, Dorier, J L, & Hollenstein, C.
Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments.
Switzerland.
Howling, A A, Dorier, J L, and Hollenstein, C.
1992.
"Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments."
Switzerland.
@misc{etde_10144877,
title = {Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments}
author = {Howling, A A, Dorier, J L, and Hollenstein, C}
abstractNote = {Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon. (author) 3 figs., 19 refs.}
place = {Switzerland}
year = {1992}
month = {Sep}
}
title = {Negative ion mass spectra and particulate formation in rf silane plasma deposition experiments}
author = {Howling, A A, Dorier, J L, and Hollenstein, C}
abstractNote = {Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon. (author) 3 figs., 19 refs.}
place = {Switzerland}
year = {1992}
month = {Sep}
}