Abstract
This paper describes a UHV system especially designed for experiments involving Laser-induced Chemical Vapor Deposition (LCVD) of thin films. The ultra-high vacuum (UHV) system consists of two sections separated by a gate valve. The first one (having a background pressure in the order of 10/sup -9/ torr) is equipped with a multi-sample holder, an optical window and gas handling, system, and it is utilized for the deposition process. The second section consists of a UHV chamber (background pressure 4X10/sup -10/ torr) dedicated to sample final surface cleaning deposition and analysis. It is provided with a quadrupole mass spectrometer (Spectramass Mod.VISA) a sputter ion gun (VG Mod.AG2), and a three-grids reverse view LEED (VG Mod.640 RVL) system with an additional high energy (up to 5 KeV) electron gun (VG LEG31) which is mounted on the chamber so that the electrons strike the sample under grazing-incidence angle. After describing equipment and the experimental set-up, the paper discusses the results obtained by ArF excimer laser deposition of Sn and Sn/sub x/O/sub y/ thin films from TMT (tetramethyltin) and oxygen.
Citation Formats
Borsella, E, Cardoni, P, Larciprete, R, and Nardelli, M.
Ultra-high vacuum system for laser-induced chemical vapor deposition.
Italy: N. p.,
1992.
Web.
Borsella, E, Cardoni, P, Larciprete, R, & Nardelli, M.
Ultra-high vacuum system for laser-induced chemical vapor deposition.
Italy.
Borsella, E, Cardoni, P, Larciprete, R, and Nardelli, M.
1992.
"Ultra-high vacuum system for laser-induced chemical vapor deposition."
Italy.
@misc{etde_10128907,
title = {Ultra-high vacuum system for laser-induced chemical vapor deposition}
author = {Borsella, E, Cardoni, P, Larciprete, R, and Nardelli, M}
abstractNote = {This paper describes a UHV system especially designed for experiments involving Laser-induced Chemical Vapor Deposition (LCVD) of thin films. The ultra-high vacuum (UHV) system consists of two sections separated by a gate valve. The first one (having a background pressure in the order of 10/sup -9/ torr) is equipped with a multi-sample holder, an optical window and gas handling, system, and it is utilized for the deposition process. The second section consists of a UHV chamber (background pressure 4X10/sup -10/ torr) dedicated to sample final surface cleaning deposition and analysis. It is provided with a quadrupole mass spectrometer (Spectramass Mod.VISA) a sputter ion gun (VG Mod.AG2), and a three-grids reverse view LEED (VG Mod.640 RVL) system with an additional high energy (up to 5 KeV) electron gun (VG LEG31) which is mounted on the chamber so that the electrons strike the sample under grazing-incidence angle. After describing equipment and the experimental set-up, the paper discusses the results obtained by ArF excimer laser deposition of Sn and Sn/sub x/O/sub y/ thin films from TMT (tetramethyltin) and oxygen.}
place = {Italy}
year = {1992}
month = {Dec}
}
title = {Ultra-high vacuum system for laser-induced chemical vapor deposition}
author = {Borsella, E, Cardoni, P, Larciprete, R, and Nardelli, M}
abstractNote = {This paper describes a UHV system especially designed for experiments involving Laser-induced Chemical Vapor Deposition (LCVD) of thin films. The ultra-high vacuum (UHV) system consists of two sections separated by a gate valve. The first one (having a background pressure in the order of 10/sup -9/ torr) is equipped with a multi-sample holder, an optical window and gas handling, system, and it is utilized for the deposition process. The second section consists of a UHV chamber (background pressure 4X10/sup -10/ torr) dedicated to sample final surface cleaning deposition and analysis. It is provided with a quadrupole mass spectrometer (Spectramass Mod.VISA) a sputter ion gun (VG Mod.AG2), and a three-grids reverse view LEED (VG Mod.640 RVL) system with an additional high energy (up to 5 KeV) electron gun (VG LEG31) which is mounted on the chamber so that the electrons strike the sample under grazing-incidence angle. After describing equipment and the experimental set-up, the paper discusses the results obtained by ArF excimer laser deposition of Sn and Sn/sub x/O/sub y/ thin films from TMT (tetramethyltin) and oxygen.}
place = {Italy}
year = {1992}
month = {Dec}
}