You need JavaScript to view this

XPS analysis of polyimide films modified by UV pulsed laser radiation at 193 nm

Technical Report:

Abstract

Polyimide films were treated in air with an Argon-Fluorine UV excimer laser ({lambda} = 193 nm). X-ray photoelectron spectroscopy (XPS) analysis was performed on the modified surfaces after laser exposure at various fluences around the threshold fluence F{sub e}. From the present data above F{sub e} the photochemical process (photoablation) leads to produce a Carbone-rich surface by ejecting mainly oxides of Carbon and Nitrogen compounds. (author). 2 figs, 2 tabs.
Publication Date:
Sep 01, 1991
Product Type:
Technical Report
Report Number:
IC-91/302
Reference Number:
SCA: 665300; PA: AIX-23:018398; SN: 92000662008
Resource Relation:
Other Information: PBD: Sep 1991
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; POLYMERS; SURFACE PROPERTIES; FILMS; LASER RADIATION; PHOTOELECTRON SPECTROSCOPY; ULTRAVIOLET RADIATION; X-RAY SPECTROSCOPY; 665300; INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
OSTI ID:
10118635
Research Organizations:
International Centre for Theoretical Physics (ICTP), Trieste (Italy)
Country of Origin:
IAEA
Language:
English
Other Identifying Numbers:
Other: ON: DE92617498; TRN: XA9230491018398
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
INIS
Size:
26 p.
Announcement Date:
Jun 30, 2005

Technical Report:

Citation Formats

Brezini, A, and Zekri, N. XPS analysis of polyimide films modified by UV pulsed laser radiation at 193 nm. IAEA: N. p., 1991. Web.
Brezini, A, & Zekri, N. XPS analysis of polyimide films modified by UV pulsed laser radiation at 193 nm. IAEA.
Brezini, A, and Zekri, N. 1991. "XPS analysis of polyimide films modified by UV pulsed laser radiation at 193 nm." IAEA.
@misc{etde_10118635,
title = {XPS analysis of polyimide films modified by UV pulsed laser radiation at 193 nm}
author = {Brezini, A, and Zekri, N}
abstractNote = {Polyimide films were treated in air with an Argon-Fluorine UV excimer laser ({lambda} = 193 nm). X-ray photoelectron spectroscopy (XPS) analysis was performed on the modified surfaces after laser exposure at various fluences around the threshold fluence F{sub e}. From the present data above F{sub e} the photochemical process (photoablation) leads to produce a Carbone-rich surface by ejecting mainly oxides of Carbon and Nitrogen compounds. (author). 2 figs, 2 tabs.}
place = {IAEA}
year = {1991}
month = {Sep}
}