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Synthesis of carbo-nitride films using high-energy shock plasma deposition

Technical Report:

Abstract

Recent investigations shows that an enhanced nitrogen content of carbo-nitride films improves wear resistance, hardness, tribological and other properties of these films. The present work reports on the properties of nitrogen rich carbon films produced by an intense gas discharge between carbon electrodes in a nitrogen atmosphere. The energy of the discharge, initial nitrogen pressure, number of discharges and geometry are varied to establish their effect on the nitrogen content and the mechanical, structural and morphological characteristics of the deposited carbon-nitride films. The structural diagnostics include optical and scanning electron microscopy, as well as Auger and Raman Spectroscopes and Rutherford Backscattering. The C-N films formed fell into two categories, differing in morphology and mechanical properties. Type I are C-N films, containing up to 35 at. % nitrogen, and which have an amorphous structure. These films are formed at relatively low plasma shock pressure and exhibit relatively low microhardness, {approx} 2 GPa. In a relatively narrow range of the plasma shock pressure and temperature the second type of C-N deposition is observed consisting of high density, closely-packed crystal-like grains growing perpendicular to the substrate surface and displaying a cauliflower-like morphology. The microhardness of these films reaches 15 GPa, as measured by  More>>
Publication Date:
Dec 31, 1994
Product Type:
Technical Report
Report Number:
UM-P-94/27
Reference Number:
SCA: 360201; 360203; PA: AIX-26:014956; EDB-95:029501; SN: 95001328827
Resource Relation:
Other Information: PBD: [1994]
Subject:
36 MATERIALS SCIENCE; CARBON NITRIDES; CRYSTAL GROWTH; MICROHARDNESS; PLASMA PRESSURE; AMORPHOUS STATE; ENERGY DENSITY; EXPERIMENTAL DATA; GAS DISCHARGE TUBES; HIGH-FREQUENCY DISCHARGES; MECHANICAL PROPERTIES; MORPHOLOGY; PRESSURE DEPENDENCE; STRUCTURAL CHEMICAL ANALYSIS; SYNTHESIS; TEMPERATURE DEPENDENCE; THIN FILMS; 360201; 360203; PREPARATION AND FABRICATION
OSTI ID:
10113595
Research Organizations:
Melbourne Univ., Parkville, VIC (Australia). School of Physics
Country of Origin:
Australia
Language:
English
Other Identifying Numbers:
Other: ON: DE95615231; TRN: AU9414229014956
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
INIS
Size:
6 p.
Announcement Date:
Jun 30, 2005

Technical Report:

Citation Formats

Gurarie, V N, Orlov, A V, Nugent, K W, Weiser, P, and Prawer, S. Synthesis of carbo-nitride films using high-energy shock plasma deposition. Australia: N. p., 1994. Web.
Gurarie, V N, Orlov, A V, Nugent, K W, Weiser, P, & Prawer, S. Synthesis of carbo-nitride films using high-energy shock plasma deposition. Australia.
Gurarie, V N, Orlov, A V, Nugent, K W, Weiser, P, and Prawer, S. 1994. "Synthesis of carbo-nitride films using high-energy shock plasma deposition." Australia.
@misc{etde_10113595,
title = {Synthesis of carbo-nitride films using high-energy shock plasma deposition}
author = {Gurarie, V N, Orlov, A V, Nugent, K W, Weiser, P, and Prawer, S}
abstractNote = {Recent investigations shows that an enhanced nitrogen content of carbo-nitride films improves wear resistance, hardness, tribological and other properties of these films. The present work reports on the properties of nitrogen rich carbon films produced by an intense gas discharge between carbon electrodes in a nitrogen atmosphere. The energy of the discharge, initial nitrogen pressure, number of discharges and geometry are varied to establish their effect on the nitrogen content and the mechanical, structural and morphological characteristics of the deposited carbon-nitride films. The structural diagnostics include optical and scanning electron microscopy, as well as Auger and Raman Spectroscopes and Rutherford Backscattering. The C-N films formed fell into two categories, differing in morphology and mechanical properties. Type I are C-N films, containing up to 35 at. % nitrogen, and which have an amorphous structure. These films are formed at relatively low plasma shock pressure and exhibit relatively low microhardness, {approx} 2 GPa. In a relatively narrow range of the plasma shock pressure and temperature the second type of C-N deposition is observed consisting of high density, closely-packed crystal-like grains growing perpendicular to the substrate surface and displaying a cauliflower-like morphology. The microhardness of these films reaches 15 GPa, as measured by the Vickers method. 14 refs., 7 figs.}
place = {Australia}
year = {1994}
month = {Dec}
}