Abstract
This work reports the results obtained from the cleaning of the Novillo Tokamak Chamber, using an A.F. Taylor Discharge Cleaning (TDC) in H{sub 2} with a power oscillator of 20 k W and 17.5 k Hz. The plasma temperature in the discharge was of one electron-volt (Te {approx_equal} 1 eV) with a moderate electron density n{sub e} {approx_equal} 4 x 10{sup 11} cm{sup -3}. This discharge cleaning was found helpful in the removal of C and O via the formation of pumping compounds such as CH{sub 4} and H{sub 2}O. A residual gas analyzer was used to monitor the partial pressure of these and other compounds, indicating removal rates as high as two monolayers/hour at the beginning of the discharge. A value of Z{sub eff} = 3 was estimated for a discharge of 7 k A after conditioning. (Author).
Citation Formats
Valencia A, R.
Power oscillator in the Tokamaks training.; Uso de un oscilador de potencia para el acondicionamiento de Tokamaks..
Mexico: N. p.,
1994.
Web.
Valencia A, R.
Power oscillator in the Tokamaks training.; Uso de un oscilador de potencia para el acondicionamiento de Tokamaks..
Mexico.
Valencia A, R.
1994.
"Power oscillator in the Tokamaks training.; Uso de un oscilador de potencia para el acondicionamiento de Tokamaks."
Mexico.
@misc{etde_10113579,
title = {Power oscillator in the Tokamaks training.; Uso de un oscilador de potencia para el acondicionamiento de Tokamaks.}
author = {Valencia A, R}
abstractNote = {This work reports the results obtained from the cleaning of the Novillo Tokamak Chamber, using an A.F. Taylor Discharge Cleaning (TDC) in H{sub 2} with a power oscillator of 20 k W and 17.5 k Hz. The plasma temperature in the discharge was of one electron-volt (Te {approx_equal} 1 eV) with a moderate electron density n{sub e} {approx_equal} 4 x 10{sup 11} cm{sup -3}. This discharge cleaning was found helpful in the removal of C and O via the formation of pumping compounds such as CH{sub 4} and H{sub 2}O. A residual gas analyzer was used to monitor the partial pressure of these and other compounds, indicating removal rates as high as two monolayers/hour at the beginning of the discharge. A value of Z{sub eff} = 3 was estimated for a discharge of 7 k A after conditioning. (Author).}
place = {Mexico}
year = {1994}
month = {Dec}
}
title = {Power oscillator in the Tokamaks training.; Uso de un oscilador de potencia para el acondicionamiento de Tokamaks.}
author = {Valencia A, R}
abstractNote = {This work reports the results obtained from the cleaning of the Novillo Tokamak Chamber, using an A.F. Taylor Discharge Cleaning (TDC) in H{sub 2} with a power oscillator of 20 k W and 17.5 k Hz. The plasma temperature in the discharge was of one electron-volt (Te {approx_equal} 1 eV) with a moderate electron density n{sub e} {approx_equal} 4 x 10{sup 11} cm{sup -3}. This discharge cleaning was found helpful in the removal of C and O via the formation of pumping compounds such as CH{sub 4} and H{sub 2}O. A residual gas analyzer was used to monitor the partial pressure of these and other compounds, indicating removal rates as high as two monolayers/hour at the beginning of the discharge. A value of Z{sub eff} = 3 was estimated for a discharge of 7 k A after conditioning. (Author).}
place = {Mexico}
year = {1994}
month = {Dec}
}