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Development of industrial ion implantation technology

Technical Report:

Abstract

On a cooperation between KAERI, Kurchatov Institute (Russia), and Mirae Co., development of a metal ion implanter and ion implantation technology is performed on a basic idea of popularization and refinement of ion implantation technology applied to the industrial components. The developed implanter is a two beam type: the mass separation line produces several mA of metal ion beams and the non-separation line produces several tens of mA gas ion beams, thus making the synergistic effect possible by the irradiation of beams from both lines. The target is made of a rotating plate of 60cm in radius and can treat various types of industrial components or parts. About 60 kinds of specimens were treated for the development of implantation technology. Two or five times lengthening of longevities were achieved on the PCB drills, razor blades, cutters, and precision dies. (Author).
Authors:
Choi, Byung Ho; Hwang, Churl Kew; Kim, Wan; Jin, Jung Tai; Jung, Ki Sok; Yoon, Su Ho; Shin, Won Churl; Kim, Jong Gook; Han, Jeon Geon; Chung, Ki Hyung [1] 
  1. Korea Atomic Energy Res. Inst., Taejon (Korea, Republic of)
Publication Date:
Jan 01, 1994
Product Type:
Technical Report
Report Number:
KAERI/RR-1290/93
Reference Number:
SCA: 665300; PA: AIX-26:013925; EDB-95:032977; SN: 95001325698
Resource Relation:
Other Information: PBD: Jan 1994
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; SURFACE TREATMENTS; ION IMPLANTATION; ACCELERATORS; DIES; DRILL BITS; ION SOURCES; 665300; INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
OSTI ID:
10112971
Research Organizations:
Korea Cancer Center Hospital, Seoul (Korea, Republic of)
Country of Origin:
Korea, Republic of
Language:
Korean
Other Identifying Numbers:
Other: ON: DE95614374; TRN: KR9400136013925
Availability:
OSTI; NTIS; INIS
Submitting Site:
KRN
Size:
265 p.
Announcement Date:
Jun 30, 2005

Technical Report:

Citation Formats

Choi, Byung Ho, Hwang, Churl Kew, Kim, Wan, Jin, Jung Tai, Jung, Ki Sok, Yoon, Su Ho, Shin, Won Churl, Kim, Jong Gook, Han, Jeon Geon, and Chung, Ki Hyung. Development of industrial ion implantation technology. Korea, Republic of: N. p., 1994. Web.
Choi, Byung Ho, Hwang, Churl Kew, Kim, Wan, Jin, Jung Tai, Jung, Ki Sok, Yoon, Su Ho, Shin, Won Churl, Kim, Jong Gook, Han, Jeon Geon, & Chung, Ki Hyung. Development of industrial ion implantation technology. Korea, Republic of.
Choi, Byung Ho, Hwang, Churl Kew, Kim, Wan, Jin, Jung Tai, Jung, Ki Sok, Yoon, Su Ho, Shin, Won Churl, Kim, Jong Gook, Han, Jeon Geon, and Chung, Ki Hyung. 1994. "Development of industrial ion implantation technology." Korea, Republic of.
@misc{etde_10112971,
title = {Development of industrial ion implantation technology}
author = {Choi, Byung Ho, Hwang, Churl Kew, Kim, Wan, Jin, Jung Tai, Jung, Ki Sok, Yoon, Su Ho, Shin, Won Churl, Kim, Jong Gook, Han, Jeon Geon, and Chung, Ki Hyung}
abstractNote = {On a cooperation between KAERI, Kurchatov Institute (Russia), and Mirae Co., development of a metal ion implanter and ion implantation technology is performed on a basic idea of popularization and refinement of ion implantation technology applied to the industrial components. The developed implanter is a two beam type: the mass separation line produces several mA of metal ion beams and the non-separation line produces several tens of mA gas ion beams, thus making the synergistic effect possible by the irradiation of beams from both lines. The target is made of a rotating plate of 60cm in radius and can treat various types of industrial components or parts. About 60 kinds of specimens were treated for the development of implantation technology. Two or five times lengthening of longevities were achieved on the PCB drills, razor blades, cutters, and precision dies. (Author).}
place = {Korea, Republic of}
year = {1994}
month = {Jan}
}