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Powder dynamics in VHF silane plasmas

Technical Report:

Abstract

Particulate contamination produced during plasma-assisted deposition of amorphous silicon devices can be responsible for reduced quality and yield. The threshold for power formation imposes an upper limit on the rf power and hence the deposition rate. In this work, the parallel-plate capacitor discharge volume is illuminated and global, spatio-temporal powder production is determined visually and from observed modifications to the discharge electrical properties such as the matching condition, the dc self bias and the rf power transfer efficiency. A systematic study has been made of the powder-free operational space as a function of rf power, rf frequency (13.56-70 MHz) and substrate temperature. (author) 6 figs., 18 refs.
Authors:
Dorier, J L; Hollenstein, C; Howling, A A; Kroll, U [1] 
  1. Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP)
Publication Date:
Sep 01, 1991
Product Type:
Technical Report
Report Number:
LRP-436/91
Reference Number:
SCA: 700330; PA: AIX-23:013637; SN: 92000639321
Resource Relation:
Other Information: PBD: Sep 1991
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; PLASMA; SILANES; POWDERS; DYNAMICS; CAMERAS; CAPACITORS; CERAMICS; CONTAMINATION; DEPOSITION; EFFICIENCY; EXPERIMENTAL DATA; FREQUENCY DEPENDENCE; LASERS; MHZ RANGE 01-100; SUBSTRATES; TEMPERATURE DEPENDENCE; 700330; PLASMA KINETICS, TRANSPORT, AND IMPURITIES
OSTI ID:
10111686
Research Organizations:
Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP)
Country of Origin:
Switzerland
Language:
English
Other Identifying Numbers:
Other: ON: DE92614459; TRN: CH9100678013637
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
CHN
Size:
20 p.
Announcement Date:
Jun 30, 2005

Technical Report:

Citation Formats

Dorier, J L, Hollenstein, C, Howling, A A, and Kroll, U. Powder dynamics in VHF silane plasmas. Switzerland: N. p., 1991. Web.
Dorier, J L, Hollenstein, C, Howling, A A, & Kroll, U. Powder dynamics in VHF silane plasmas. Switzerland.
Dorier, J L, Hollenstein, C, Howling, A A, and Kroll, U. 1991. "Powder dynamics in VHF silane plasmas." Switzerland.
@misc{etde_10111686,
title = {Powder dynamics in VHF silane plasmas}
author = {Dorier, J L, Hollenstein, C, Howling, A A, and Kroll, U}
abstractNote = {Particulate contamination produced during plasma-assisted deposition of amorphous silicon devices can be responsible for reduced quality and yield. The threshold for power formation imposes an upper limit on the rf power and hence the deposition rate. In this work, the parallel-plate capacitor discharge volume is illuminated and global, spatio-temporal powder production is determined visually and from observed modifications to the discharge electrical properties such as the matching condition, the dc self bias and the rf power transfer efficiency. A systematic study has been made of the powder-free operational space as a function of rf power, rf frequency (13.56-70 MHz) and substrate temperature. (author) 6 figs., 18 refs.}
place = {Switzerland}
year = {1991}
month = {Sep}
}