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Development of Microstrip Gas Chambers with Multi-Chip technology

Technical Report:

Abstract

We have developed the Microstrip Gas Chamber (MSGC) by using Multi-Chiptechnology which supports high-density assembly of bare LSI chips on a silicon wafer. Our MSGC was operated steadily with {approx} 10{sup 3} gain more than one week. An energy resolution of 15% for 5.9 keV X-ray of {sup 55}Fe source was obtained. With a very thin polyimide substrate of 16 {mu}m thickness, two interesting phenomena were observed; one was a strong dependence of gains on back plane potential, and the other was little time variation of gains. We also found that a guard mask of a thin polyimide layer on the cathode edge reduced incidental electrical discharges between anode and cathode strips. (author).
Publication Date:
Mar 01, 1992
Product Type:
Technical Report
Report Number:
INS-919
Reference Number:
SCA: 440800; PA: JPN-92:011090; SN: 93000918495
Resource Relation:
Other Information: PBD: Mar 1992
Subject:
47 OTHER INSTRUMENTATION; CHARGED PARTICLE DETECTION; GAS TRACK DETECTORS; SI SEMICONDUCTOR DETECTORS; ENERGY RESOLUTION; X RADIATION; SUBSTRATES; ANODES; CATHODES; INTEGRATED CIRCUITS; MEASURING METHODS; SEMICONDUCTOR MATERIALS; 440800; MISCELLANEOUS INSTRUMENTATION
OSTI ID:
10111123
Research Organizations:
Tokyo Univ., Tanashi (Japan). Inst. for Nuclear Study
Country of Origin:
Japan
Language:
English
Other Identifying Numbers:
Other: ON: DE93753169; TRN: JP9211090
Availability:
OSTI; NTIS; INIS
Submitting Site:
JPN
Size:
15 p.
Announcement Date:
Jun 30, 2005

Technical Report:

Citation Formats

Nagae, T, Tanimori, T, Kobayashi, T, and Miyagi, T. Development of Microstrip Gas Chambers with Multi-Chip technology. Japan: N. p., 1992. Web.
Nagae, T, Tanimori, T, Kobayashi, T, & Miyagi, T. Development of Microstrip Gas Chambers with Multi-Chip technology. Japan.
Nagae, T, Tanimori, T, Kobayashi, T, and Miyagi, T. 1992. "Development of Microstrip Gas Chambers with Multi-Chip technology." Japan.
@misc{etde_10111123,
title = {Development of Microstrip Gas Chambers with Multi-Chip technology}
author = {Nagae, T, Tanimori, T, Kobayashi, T, and Miyagi, T}
abstractNote = {We have developed the Microstrip Gas Chamber (MSGC) by using Multi-Chiptechnology which supports high-density assembly of bare LSI chips on a silicon wafer. Our MSGC was operated steadily with {approx} 10{sup 3} gain more than one week. An energy resolution of 15% for 5.9 keV X-ray of {sup 55}Fe source was obtained. With a very thin polyimide substrate of 16 {mu}m thickness, two interesting phenomena were observed; one was a strong dependence of gains on back plane potential, and the other was little time variation of gains. We also found that a guard mask of a thin polyimide layer on the cathode edge reduced incidental electrical discharges between anode and cathode strips. (author).}
place = {Japan}
year = {1992}
month = {Mar}
}