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Low-energy ion-beam deposition apparatus equipped with surface analysis system

Technical Report:

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Abstract

A sophisticated apparatus for low energy ion beam deposition (IBD) was installed at Takasaki Radiation Chemistry Research Establishment of JAERI in March 1991. The apparatus is composed of an IBD system and a real time/in-situ surface analysis system for diagnosing deposited thin films. The IBD system provides various kinds of low energy ion down to 10 eV with current density of 10 {mu}A/cm{sup 2} and irradiation area of 15x15 mm{sup 2}. The surface analysis system consists of RHEED, AES, ISS and SIMS. This report describes the characteristics and the operation procedure of the apparatus together with some experimental results on depositing thin carbon films. (author).
Authors:
Ohno, Hideki; [1]  Aoki, Yasushi; Nagai, Siro
  1. Meisei Univ., Hino, Tokyo (Japan)
Publication Date:
Oct 01, 1994
Product Type:
Technical Report
Report Number:
JAERI-Research-94-018
Reference Number:
SCA: 661220; PA: JPN-94:012180; EDB-95:025517; SN: 95001319988
Resource Relation:
Other Information: PBD: Oct 1994
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; VAPOR DEPOSITED COATINGS; ION BEAMS; PHYSICAL VAPOR DEPOSITION; VACUUM COATING; SURFACE PROPERTIES; BEAM CURRENTS; IRRADIATION PROCEDURES; IRRADIATION DEVICES; AUGER ELECTRON SPECTROSCOPY; MASS SPECTROMETERS; THIN FILMS; SURFACES; REAL TIME SYSTEMS; KEV RANGE 01-10; EV RANGE 10-100; EV RANGE 100-1000; 661220; PARTICLE BEAM PRODUCTION AND HANDLING; TARGETS
OSTI ID:
10109323
Research Organizations:
Japan Atomic Energy Research Inst., Tokyo (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE95737272; TRN: JP9412180
Availability:
OSTI; NTIS; INIS
Submitting Site:
JPN
Size:
51 p.
Announcement Date:
Jun 30, 2005

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Citation Formats

Ohno, Hideki, Aoki, Yasushi, and Nagai, Siro. Low-energy ion-beam deposition apparatus equipped with surface analysis system. Japan: N. p., 1994. Web.
Ohno, Hideki, Aoki, Yasushi, & Nagai, Siro. Low-energy ion-beam deposition apparatus equipped with surface analysis system. Japan.
Ohno, Hideki, Aoki, Yasushi, and Nagai, Siro. 1994. "Low-energy ion-beam deposition apparatus equipped with surface analysis system." Japan.
@misc{etde_10109323,
title = {Low-energy ion-beam deposition apparatus equipped with surface analysis system}
 author = {Ohno, Hideki, Aoki, Yasushi, and Nagai, Siro}
 abstractNote = {A sophisticated apparatus for low energy ion beam deposition (IBD) was installed at Takasaki Radiation Chemistry Research Establishment of JAERI in March 1991. The apparatus is composed of an IBD system and a real time/in-situ surface analysis system for diagnosing deposited thin films. The IBD system provides various kinds of low energy ion down to 10 eV with current density of 10 {mu}A/cm{sup 2} and irradiation area of 15x15 mm{sup 2}. The surface analysis system consists of RHEED, AES, ISS and SIMS. This report describes the characteristics and the operation procedure of the apparatus together with some experimental results on depositing thin carbon films. (author).}
 place = {Japan}
 year = {1994}
 month = {Oct}
 }