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Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond

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Abstract

Auger Electron Spectroscopy has been employed to investigate the effectiveness of thin films of TiN as barriers to carbon diffusion during Chemical Vapor Deposition (CVD) of diamond onto Fe substrates. Auger Depth Profiling was used to monitor the C concentration in the TiN layer, through the interface and into the substrate both before and after CVD diamond deposition. The results show that a layer of TiN only 250 Angstroems thick is sufficient to inhibit soot formation on the Fe surface and C diffusion into the Fe bulk. 14 refs., 4 figs.
Authors:
Weiser, P S; Prawer, S; [1]  Hoffman, A; [2]  Manory, R R; Paterson, P J.K.; Stuart, Sue-Anne [3] 
  1. Melbourne Univ., Parkville (Australia). School of Physics
  2. Australian Nuclear Science and Technology Organisation, Lucas Heights (Australia)
  3. Royal Melbourne Inst. of Tech. (Australia)
Publication Date:
Dec 31, 1992
Product Type:
Technical Report
Report Number:
UM-P-92/23
Reference Number:
SCA: 360101; 400101; PA: AIX-24:000310; SN: 93000912693
Resource Relation:
Other Information: PBD: [1992]
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; AUGER ELECTRON SPECTROSCOPY; THIN FILMS; DIAMONDS; CHEMICAL VAPOR DEPOSITION; IRON; TITANIUM NITRIDES; DIFFUSION BARRIERS; CARBON; EXPERIMENTAL DATA; SUBSTRATES; 360101; 400101; PREPARATION AND FABRICATION; ACTIVATION, NUCLEAR REACTION, RADIOMETRIC, AND RADIOCHEMICAL PROCEDURES
OSTI ID:
10108623
Research Organizations:
Melbourne Univ., Parkville, VIC (Australia). School of Physics
Country of Origin:
Australia
Language:
English
Other Identifying Numbers:
Other: ON: DE93608934; TRN: AU9212942000310
Availability:
OSTI; NTIS (US Sales Only); INIS
Submitting Site:
INIS
Size:
[14] p.
Announcement Date:
Jun 30, 2005

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Citation Formats

Weiser, P S, Prawer, S, Hoffman, A, Manory, R R, Paterson, P J.K., and Stuart, Sue-Anne. Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond. Australia: N. p., 1992. Web.
Weiser, P S, Prawer, S, Hoffman, A, Manory, R R, Paterson, P J.K., & Stuart, Sue-Anne. Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond. Australia.
Weiser, P S, Prawer, S, Hoffman, A, Manory, R R, Paterson, P J.K., and Stuart, Sue-Anne. 1992. "Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond." Australia.
@misc{etde_10108623,
title = {Carbon diffusion in uncoated and titanium nitride coated iron substrates during microwave plasma assisted chemical vapor deposition of diamond}
 author = {Weiser, P S, Prawer, S, Hoffman, A, Manory, R R, Paterson, P J.K., and Stuart, Sue-Anne}
 abstractNote = {Auger Electron Spectroscopy has been employed to investigate the effectiveness of thin films of TiN as barriers to carbon diffusion during Chemical Vapor Deposition (CVD) of diamond onto Fe substrates. Auger Depth Profiling was used to monitor the C concentration in the TiN layer, through the interface and into the substrate both before and after CVD diamond deposition. The results show that a layer of TiN only 250 Angstroems thick is sufficient to inhibit soot formation on the Fe surface and C diffusion into the Fe bulk. 14 refs., 4 figs.}
 place = {Australia}
 year = {1992}
 month = {Dec}
 }