Abstract
This paper is a collection of research reports of 1993 regarding very high temperature technology published by Japan Science and Technology Agency. High-frequency thermal plasma (RF plasma) under the very high temperature generation method in the very high temperature (4000 - 10000 {degree}C) processing technology that has recently been attracting attention of the industry have various features. The high-reactive chemical species in plasma have the same important reaction as found in diamond thin film synthesis. As an application technology, the torch is essential for generating plasma for a long time. The torch for creating the characteristic chemical species should be developed as an important factor. The measurement technologies were developed involving in these generation technologies. The main study of the very high temperature station is the development of the very high temperature generation mechanism and the application technologies. The study overview presents the development of generation system, plasma stability, measurement control, application technologies, simultaneous emission of RF plasma and UV laser, phase transfer of {alpha}-alumina in plasma, and others. Related researches are separately collected and attached to the paper as the supplement. As a result of these researches, 43 reports were presented on the paper, and 4 patents were applied
More>>
Citation Formats
None.
Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2.
Japan: N. p.,
1993.
Web.
None.
Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2.
Japan.
None.
1993.
"Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2."
Japan.
@misc{etde_10108209,
title = {Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2}
author = {None}
abstractNote = {This paper is a collection of research reports of 1993 regarding very high temperature technology published by Japan Science and Technology Agency. High-frequency thermal plasma (RF plasma) under the very high temperature generation method in the very high temperature (4000 - 10000 {degree}C) processing technology that has recently been attracting attention of the industry have various features. The high-reactive chemical species in plasma have the same important reaction as found in diamond thin film synthesis. As an application technology, the torch is essential for generating plasma for a long time. The torch for creating the characteristic chemical species should be developed as an important factor. The measurement technologies were developed involving in these generation technologies. The main study of the very high temperature station is the development of the very high temperature generation mechanism and the application technologies. The study overview presents the development of generation system, plasma stability, measurement control, application technologies, simultaneous emission of RF plasma and UV laser, phase transfer of {alpha}-alumina in plasma, and others. Related researches are separately collected and attached to the paper as the supplement. As a result of these researches, 43 reports were presented on the paper, and 4 patents were applied in Japan. 96 refs., 82 figs., 6 tabs.}
place = {Japan}
year = {1993}
month = {Nov}
}
title = {Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2}
author = {None}
abstractNote = {This paper is a collection of research reports of 1993 regarding very high temperature technology published by Japan Science and Technology Agency. High-frequency thermal plasma (RF plasma) under the very high temperature generation method in the very high temperature (4000 - 10000 {degree}C) processing technology that has recently been attracting attention of the industry have various features. The high-reactive chemical species in plasma have the same important reaction as found in diamond thin film synthesis. As an application technology, the torch is essential for generating plasma for a long time. The torch for creating the characteristic chemical species should be developed as an important factor. The measurement technologies were developed involving in these generation technologies. The main study of the very high temperature station is the development of the very high temperature generation mechanism and the application technologies. The study overview presents the development of generation system, plasma stability, measurement control, application technologies, simultaneous emission of RF plasma and UV laser, phase transfer of {alpha}-alumina in plasma, and others. Related researches are separately collected and attached to the paper as the supplement. As a result of these researches, 43 reports were presented on the paper, and 4 patents were applied in Japan. 96 refs., 82 figs., 6 tabs.}
place = {Japan}
year = {1993}
month = {Nov}
}