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Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2

Miscellaneous:

Abstract

This paper is a collection of research reports of 1993 regarding very high temperature technology published by Japan Science and Technology Agency. High-frequency thermal plasma (RF plasma) under the very high temperature generation method in the very high temperature (4000 - 10000 {degree}C) processing technology that has recently been attracting attention of the industry have various features. The high-reactive chemical species in plasma have the same important reaction as found in diamond thin film synthesis. As an application technology, the torch is essential for generating plasma for a long time. The torch for creating the characteristic chemical species should be developed as an important factor. The measurement technologies were developed involving in these generation technologies. The main study of the very high temperature station is the development of the very high temperature generation mechanism and the application technologies. The study overview presents the development of generation system, plasma stability, measurement control, application technologies, simultaneous emission of RF plasma and UV laser, phase transfer of {alpha}-alumina in plasma, and others. Related researches are separately collected and attached to the paper as the supplement. As a result of these researches, 43 reports were presented on the paper, and 4 patents were applied  More>>
Publication Date:
Nov 25, 1993
Product Type:
Miscellaneous
Report Number:
ETDE/JP-mf-95730105
Reference Number:
SCA: 661220; 420400; 360000; PA: NEDO-94:930160; EDB-95:025571; SN: 95001310776
Resource Relation:
Other Information: PBD: 25 Nov 1993
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 42 ENGINEERING; 36 MATERIALS SCIENCE; THERMOMECHANICAL TREATMENTS; TEMPERATURE RANGE OVER 4000 K; PLASMA; RF SYSTEMS; HIGH-FREQUENCY HEATING; REACTION INTERMEDIATES; ACTIVATION ENERGY; THIN FILMS; DIAMONDS; SYNTHESIS; PLASMA GUNS; MEASURING METHODS; PLASMA INSTABILITY; CONTROL SYSTEMS; ULTRAVIOLET RADIATION; LASER RADIATION; ALUMINIUM OXIDES; CRYSTAL-PHASE TRANSFORMATIONS; 661220; 420400; 360000; PARTICLE BEAM PRODUCTION AND HANDLING; TARGETS; HEAT TRANSFER AND FLUID FLOW; MATERIALS
OSTI ID:
10108209
Research Organizations:
National Inst. for Research in Inorganic Materials, Tsukuba (Japan)
Country of Origin:
Japan
Language:
Japanese
Other Identifying Numbers:
Other: ON: DE95730105; TRN: 94:930160
Availability:
OSTI; NTIS; Available from National Institute for Research in Inorganic Materials, 1-1, Namiki, Tsukuba, Ibaraki, Japan
Submitting Site:
NEDO
Size:
52 p.
Announcement Date:
Jun 30, 2005

Miscellaneous:

Citation Formats

None. Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2. Japan: N. p., 1993. Web.
None. Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2. Japan.
None. 1993. "Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2." Japan.
@misc{etde_10108209,
title = {Study of very high temperature technology. 2; Chokoon gijutsu ni kansuru kenkyu. 2}
author = {None}
abstractNote = {This paper is a collection of research reports of 1993 regarding very high temperature technology published by Japan Science and Technology Agency. High-frequency thermal plasma (RF plasma) under the very high temperature generation method in the very high temperature (4000 - 10000 {degree}C) processing technology that has recently been attracting attention of the industry have various features. The high-reactive chemical species in plasma have the same important reaction as found in diamond thin film synthesis. As an application technology, the torch is essential for generating plasma for a long time. The torch for creating the characteristic chemical species should be developed as an important factor. The measurement technologies were developed involving in these generation technologies. The main study of the very high temperature station is the development of the very high temperature generation mechanism and the application technologies. The study overview presents the development of generation system, plasma stability, measurement control, application technologies, simultaneous emission of RF plasma and UV laser, phase transfer of {alpha}-alumina in plasma, and others. Related researches are separately collected and attached to the paper as the supplement. As a result of these researches, 43 reports were presented on the paper, and 4 patents were applied in Japan. 96 refs., 82 figs., 6 tabs.}
place = {Japan}
year = {1993}
month = {Nov}
}